Investigations of substrate-selective covalent attachment for genetically-engineered molecular interconnects

N. Rana*, K. Bousman, G. S. Shekhawat, G. Sirinakis, F. Heuchling, J. Welch, E. T. Eisenbraun, R. E. Geer, A. E. Kaloyeros

*Corresponding author for this work

Research output: Contribution to journalConference articlepeer-review

1 Scopus citations


Experimental investigations are presented regarding the surface-selective molecular self-assembly of fluorinated monochloroalkylsilane of the type (heptadecafluoro-1,1,2,2-tetrahydrodecyl) dimethylchlorosilane (denoted F17) on silicon dioxide (SiO2) and silicon nitride (Si3N4) surfaces. The goal is to investigate the controlled and selective surface self-assembly of these molecules as a potential route for substrate-selective covalent bonding of complex molecular assemblies to semiconductor substrates for on-chip interconnect and device applications. X-ray photoelectron spectroscopy (XPS), x-ray reflectivity (XRR) and atomic force microscopy (AFM) have been used to investigate the selectivity of the F17 self-assembly. Contrary to previous reported results, a high degree of F17 monolayer attachment selectivity is consistently observed between SiO2 and Si3N4 substrates for all three of the aforementioned monolayer characterization methods.

Original languageEnglish (US)
Pages (from-to)45-52
Number of pages8
JournalMaterials Research Society Symposium - Proceedings
StatePublished - Jan 1 2002
EventFunctional Nanostructured Materials through Multiscale Assembly and Novel Pattering Techniques - San Francisco, CA, United States
Duration: Apr 2 2002Apr 5 2002

ASJC Scopus subject areas

  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering


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