Abstract
Experimental investigations are presented regarding the surface-selective molecular self-assembly of fluorinated monochloroalkylsilane of the type (heptadecafluoro-1,1,2,2-tetrahydrodecyl) dimethylchlorosilane (denoted F17) on silicon dioxide (SiO2) and silicon nitride (Si3N4) surfaces. The goal is to investigate the controlled and selective surface self-assembly of these molecules as a potential route for substrate-selective covalent bonding of complex molecular assemblies to semiconductor substrates for on-chip interconnect and device applications. X-ray photoelectron spectroscopy (XPS), x-ray reflectivity (XRR) and atomic force microscopy (AFM) have been used to investigate the selectivity of the F17 self-assembly. Contrary to previous reported results, a high degree of F17 monolayer attachment selectivity is consistently observed between SiO2 and Si3N4 substrates for all three of the aforementioned monolayer characterization methods.
Original language | English (US) |
---|---|
Pages (from-to) | 45-52 |
Number of pages | 8 |
Journal | Materials Research Society Symposium - Proceedings |
Volume | 728 |
DOIs | |
State | Published - Jan 1 2002 |
Event | Functional Nanostructured Materials through Multiscale Assembly and Novel Pattering Techniques - San Francisco, CA, United States Duration: Apr 2 2002 → Apr 5 2002 |
ASJC Scopus subject areas
- General Materials Science
- Condensed Matter Physics
- Mechanics of Materials
- Mechanical Engineering