ION/SURFACE AND PHOTON/SURFACE INTERACTIONS DURING VAPOR PHASE CRYSTAL GROWTH.

J. E. Greene; S. A. Barnett; D. Lubben

ION/SURFACE AND PHOTON/SURFACE INTERACTIONS DURING VAPOR PHASE CRYSTAL GROWTH.

J. E. Greene^*, S. A. Barnett, D. Lubben

^*Corresponding author for this work

Materials Science and Engineering

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Abstract

In this abstract the respective roles of ion/surface and photon/surface interactions during vapor-phase crystal growth are reviewed and compared. While photon/surface interactions have been the subject of considerable recent interest partly due to the development of LCVD, ion/surface interactions have been studied extensively and are presently employed in film deposition techniques such as sputter deposition, plasma-enhanced chemical vapor deposition and ion-doped molecular beam epitaxy. The effect of low energy ion bombardment on nucleation, film growth kinetics, phase stability, elemental incorporation probabilities, and dopant depth distributions are described. Effects due to photon irradiation, e. g. photodissociation of adsorbed molecules, dopant redistribution and alloy formation by laser melting, and localized pyrolysis by focused laser heating, are also described.

Original language	English (US)
Title of host publication	Unknown Host Publication Title
Publisher	Materials Research Soc
Pages	9-11
Number of pages	3
State	Published - Dec 1 1984

ASJC Scopus subject areas

Engineering(all)

Cite this

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title = "ION/SURFACE AND PHOTON/SURFACE INTERACTIONS DURING VAPOR PHASE CRYSTAL GROWTH.",

abstract = "In this abstract the respective roles of ion/surface and photon/surface interactions during vapor-phase crystal growth are reviewed and compared. While photon/surface interactions have been the subject of considerable recent interest partly due to the development of LCVD, ion/surface interactions have been studied extensively and are presently employed in film deposition techniques such as sputter deposition, plasma-enhanced chemical vapor deposition and ion-doped molecular beam epitaxy. The effect of low energy ion bombardment on nucleation, film growth kinetics, phase stability, elemental incorporation probabilities, and dopant depth distributions are described. Effects due to photon irradiation, e. g. photodissociation of adsorbed molecules, dopant redistribution and alloy formation by laser melting, and localized pyrolysis by focused laser heating, are also described.",

author = "Greene, {J. E.} and Barnett, {S. A.} and D. Lubben",

year = "1984",

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language = "English (US)",

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T1 - ION/SURFACE AND PHOTON/SURFACE INTERACTIONS DURING VAPOR PHASE CRYSTAL GROWTH.

AU - Greene, J. E.

AU - Barnett, S. A.

AU - Lubben, D.

PY - 1984/12/1

Y1 - 1984/12/1

N2 - In this abstract the respective roles of ion/surface and photon/surface interactions during vapor-phase crystal growth are reviewed and compared. While photon/surface interactions have been the subject of considerable recent interest partly due to the development of LCVD, ion/surface interactions have been studied extensively and are presently employed in film deposition techniques such as sputter deposition, plasma-enhanced chemical vapor deposition and ion-doped molecular beam epitaxy. The effect of low energy ion bombardment on nucleation, film growth kinetics, phase stability, elemental incorporation probabilities, and dopant depth distributions are described. Effects due to photon irradiation, e. g. photodissociation of adsorbed molecules, dopant redistribution and alloy formation by laser melting, and localized pyrolysis by focused laser heating, are also described.

AB - In this abstract the respective roles of ion/surface and photon/surface interactions during vapor-phase crystal growth are reviewed and compared. While photon/surface interactions have been the subject of considerable recent interest partly due to the development of LCVD, ion/surface interactions have been studied extensively and are presently employed in film deposition techniques such as sputter deposition, plasma-enhanced chemical vapor deposition and ion-doped molecular beam epitaxy. The effect of low energy ion bombardment on nucleation, film growth kinetics, phase stability, elemental incorporation probabilities, and dopant depth distributions are described. Effects due to photon irradiation, e. g. photodissociation of adsorbed molecules, dopant redistribution and alloy formation by laser melting, and localized pyrolysis by focused laser heating, are also described.

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M3 - Conference contribution

AN - SCOPUS:0021656247

SP - 9

EP - 11

BT - Unknown Host Publication Title

PB - Materials Research Soc

ER -

ION/SURFACE AND PHOTON/SURFACE INTERACTIONS DURING VAPOR PHASE CRYSTAL GROWTH.

Abstract

ASJC Scopus subject areas

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