In this abstract the respective roles of ion/surface and photon/surface interactions during vapor-phase crystal growth are reviewed and compared. While photon/surface interactions have been the subject of considerable recent interest partly due to the development of LCVD, ion/surface interactions have been studied extensively and are presently employed in film deposition techniques such as sputter deposition, plasma-enhanced chemical vapor deposition and ion-doped molecular beam epitaxy. The effect of low energy ion bombardment on nucleation, film growth kinetics, phase stability, elemental incorporation probabilities, and dopant depth distributions are described. Effects due to photon irradiation, e. g. photodissociation of adsorbed molecules, dopant redistribution and alloy formation by laser melting, and localized pyrolysis by focused laser heating, are also described.
|Original language||English (US)|
|Title of host publication||Unknown Host Publication Title|
|Publisher||Materials Research Soc|
|Number of pages||3|
|State||Published - Dec 1 1984|
ASJC Scopus subject areas