Abstract
Au nanostructures are remarkably important in a wide variety of fields for decades. The fabrication of Au nanostructures typically requires time-consuming and expensive electron-beam lithography (EBL) that operates in vacuum. To address this challenge, this paper reports the development of massive dip-pen nanodisplacement lithography (DNL) as a desktop fabrication tool, which allows high-throughput and rational design of arbitrary Au nanopatterns in ambient condition. Large-area (1 cm2) and uniform (<10% variation) Au nanostructures as small as 70 nm are readily fabricated, with a throughput 100-fold higher than that of conventional EBL. As a proof-of-concept of the applications in the opitcal field, we fabricate discrete Au nanorod arrays that show significant plasmonic resonance in the visible range, and interconnected Au nanomeshes that are used for transparent conductive electrode of solar cells.
| Original language | English (US) |
|---|---|
| Article number | 1702003 |
| Journal | Small |
| Volume | 13 |
| Issue number | 43 |
| DOIs | |
| State | Published - Nov 20 2017 |
Funding
L.N.C. and X.L.W. contributed equally to this work. Z.J.Z. acknowledges the Hong Kong Polytechnic University (4-BCBM, 1ZE27) and General Research Fund of Hong Kong (PolyU 153202/16P) for financial support of this work. C.A.M. and Z.X. acknowledge support by the AFOSR under award FA9550-16-1-0150 and the National Science Foundation under award DBI-1353682. The authors thank Dr. Danqing Liu and Prof. Qian Miao at the Chinese University of Hong Kong for their help with Au film evaporation on silicon substrate.
Keywords
- nanofabrication
- polymer brush
- scanning probe lithography
- solar cells
- transparent conductive electrodes
ASJC Scopus subject areas
- General Chemistry
- Engineering (miscellaneous)
- Biotechnology
- General Materials Science
- Biomaterials