Large second-order optical nonlinearities in pulsed laser ablated silicon carbide thin films

P. M. Lundquist*, H. C. Ong, W. P. Lin, R. P.H. Chang, J. B. Ketterson, G. K. Wong

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

21 Scopus citations

Abstract

Large second-order nonlinear optical response has been observed in silicon carbide thin films deposited by pulsed laser ablation on sapphire and fused silica substrates; films on both substrates were uniform and optically transparent but exhibited distinct orientations. The d33 values of the sapphire-substrate samples were determined to be 10 pm/V.

Original languageEnglish (US)
Pages (from-to)2919
Number of pages1
JournalApplied Physics Letters
Volume67
DOIs
StatePublished - 1995

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

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