Large second-order optical nonlinearities in pulsed laser ablated silicon carbide thin films

P. M. Lundquist; H. C. Ong; W. P. Lin; R. P.H. Chang; J. B. Ketterson; G. K. Wong

doi:10.1063/1.114842

Large second-order optical nonlinearities in pulsed laser ablated silicon carbide thin films

P. M. Lundquist^*, H. C. Ong, W. P. Lin, R. P.H. Chang, J. B. Ketterson, G. K. Wong

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

21 Scopus citations

Abstract

Large second-order nonlinear optical response has been observed in silicon carbide thin films deposited by pulsed laser ablation on sapphire and fused silica substrates; films on both substrates were uniform and optically transparent but exhibited distinct orientations. The d₃₃ values of the sapphire-substrate samples were determined to be 10 pm/V.

Original language	English (US)
Pages (from-to)	2919
Number of pages	1
Journal	Applied Physics Letters
Volume	67
DOIs	https://doi.org/10.1063/1.114842
State	Published - 1995

ASJC Scopus subject areas

Physics and Astronomy (miscellaneous)

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@article{f1f5dad9cd8a4a0eb994bbecd65c9feb,

title = "Large second-order optical nonlinearities in pulsed laser ablated silicon carbide thin films",

abstract = "Large second-order nonlinear optical response has been observed in silicon carbide thin films deposited by pulsed laser ablation on sapphire and fused silica substrates; films on both substrates were uniform and optically transparent but exhibited distinct orientations. The d33 values of the sapphire-substrate samples were determined to be 10 pm/V.",

author = "Lundquist, {P. M.} and Ong, {H. C.} and Lin, {W. P.} and Chang, {R. P.H.} and Ketterson, {J. B.} and Wong, {G. K.}",

year = "1995",

doi = "10.1063/1.114842",

language = "English (US)",

volume = "67",

pages = "2919",

journal = "Applied Physics Letters",

issn = "0003-6951",

publisher = "American Institute of Physics Publising LLC",

}

TY - JOUR

T1 - Large second-order optical nonlinearities in pulsed laser ablated silicon carbide thin films

AU - Lundquist, P. M.

AU - Ong, H. C.

AU - Lin, W. P.

AU - Chang, R. P.H.

AU - Ketterson, J. B.

AU - Wong, G. K.

PY - 1995

Y1 - 1995

N2 - Large second-order nonlinear optical response has been observed in silicon carbide thin films deposited by pulsed laser ablation on sapphire and fused silica substrates; films on both substrates were uniform and optically transparent but exhibited distinct orientations. The d33 values of the sapphire-substrate samples were determined to be 10 pm/V.

AB - Large second-order nonlinear optical response has been observed in silicon carbide thin films deposited by pulsed laser ablation on sapphire and fused silica substrates; films on both substrates were uniform and optically transparent but exhibited distinct orientations. The d33 values of the sapphire-substrate samples were determined to be 10 pm/V.

UR - http://www.scopus.com/inward/record.url?scp=0029410036&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0029410036&partnerID=8YFLogxK

U2 - 10.1063/1.114842

DO - 10.1063/1.114842

M3 - Article

AN - SCOPUS:0029410036

VL - 67

SP - 2919

JO - Applied Physics Letters

JF - Applied Physics Letters

SN - 0003-6951

ER -

Large second-order optical nonlinearities in pulsed laser ablated silicon carbide thin films

Abstract

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