Laser assisted field induced oxide nanopatterning of hydrogen passivated silicon surfaces

L. S.C. Pingree; M. J. Schmitz; D. E. Kramer; M. C. Hersam

doi:10.1063/1.2771061

Laser assisted field induced oxide nanopatterning of hydrogen passivated silicon surfaces

L. S.C. Pingree^*, M. J. Schmitz, D. E. Kramer, M. C. Hersam

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

2 Scopus citations

Abstract

Field induced oxide (FIO) nanopatterning of hydrogen passivated silicon surfaces with an atomic force microscope (AFM) has been controlled by laser irradiation. Specifically, local oxidation on H:Si(111) surfaces can be fully suppressed or activated by toggling a laser that is illuminating a lightly doped silicon AFM cantilever. The nanopatterning mechanism is attributed to the control of the free carrier concentration in the AFM probe by the laser. When the laser is toggled off, charge injection is terminated, thus eliminating the electrochemical reactions required for oxide formation. Laser assisted FIO provides an alternative and flexible means for controlling oxide nanopatterning.

Original language	English (US)
Article number	073110
Journal	Applied Physics Letters
Volume	91
Issue number	7
DOIs	https://doi.org/10.1063/1.2771061
State	Published - 2007
Externally published	Yes

ASJC Scopus subject areas

Physics and Astronomy (miscellaneous)

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title = "Laser assisted field induced oxide nanopatterning of hydrogen passivated silicon surfaces",

abstract = "Field induced oxide (FIO) nanopatterning of hydrogen passivated silicon surfaces with an atomic force microscope (AFM) has been controlled by laser irradiation. Specifically, local oxidation on H:Si(111) surfaces can be fully suppressed or activated by toggling a laser that is illuminating a lightly doped silicon AFM cantilever. The nanopatterning mechanism is attributed to the control of the free carrier concentration in the AFM probe by the laser. When the laser is toggled off, charge injection is terminated, thus eliminating the electrochemical reactions required for oxide formation. Laser assisted FIO provides an alternative and flexible means for controlling oxide nanopatterning.",

author = "Pingree, {L. S.C.} and Schmitz, {M. J.} and Kramer, {D. E.} and Hersam, {M. C.}",

note = "Funding Information: The authors thank Nathan Yoder for numerous insightful conversations. This work was supported by the National Science Foundation Nanoscale Science and Engineering Center under NSF Award No. EEC-0647560, the Army Research Office Young Investigator Program under ARO Award No. W911NF-05-1-0177, and an Alfred P. Sloan Research Fellowship. ",

year = "2007",

doi = "10.1063/1.2771061",

language = "English (US)",

volume = "91",

journal = "Applied Physics Letters",

issn = "0003-6951",

publisher = "American Institute of Physics",

number = "7",

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TY - JOUR

T1 - Laser assisted field induced oxide nanopatterning of hydrogen passivated silicon surfaces

AU - Pingree, L. S.C.

AU - Schmitz, M. J.

AU - Kramer, D. E.

AU - Hersam, M. C.

N1 - Funding Information: The authors thank Nathan Yoder for numerous insightful conversations. This work was supported by the National Science Foundation Nanoscale Science and Engineering Center under NSF Award No. EEC-0647560, the Army Research Office Young Investigator Program under ARO Award No. W911NF-05-1-0177, and an Alfred P. Sloan Research Fellowship.

PY - 2007

Y1 - 2007

N2 - Field induced oxide (FIO) nanopatterning of hydrogen passivated silicon surfaces with an atomic force microscope (AFM) has been controlled by laser irradiation. Specifically, local oxidation on H:Si(111) surfaces can be fully suppressed or activated by toggling a laser that is illuminating a lightly doped silicon AFM cantilever. The nanopatterning mechanism is attributed to the control of the free carrier concentration in the AFM probe by the laser. When the laser is toggled off, charge injection is terminated, thus eliminating the electrochemical reactions required for oxide formation. Laser assisted FIO provides an alternative and flexible means for controlling oxide nanopatterning.

AB - Field induced oxide (FIO) nanopatterning of hydrogen passivated silicon surfaces with an atomic force microscope (AFM) has been controlled by laser irradiation. Specifically, local oxidation on H:Si(111) surfaces can be fully suppressed or activated by toggling a laser that is illuminating a lightly doped silicon AFM cantilever. The nanopatterning mechanism is attributed to the control of the free carrier concentration in the AFM probe by the laser. When the laser is toggled off, charge injection is terminated, thus eliminating the electrochemical reactions required for oxide formation. Laser assisted FIO provides an alternative and flexible means for controlling oxide nanopatterning.

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Laser assisted field induced oxide nanopatterning of hydrogen passivated silicon surfaces

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