Layout decomposition co-optimization for hybrid e-beam and multiple patterning lithography

Yunfeng Yang, Wai Shing Luk, Hai Zhou, Changhao Yan*, Xuan Zeng, Dian Zhou

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingConference contribution

7 Scopus citations

Abstract

As the feature size keeps scaling down and the circuit complexity increases rapidly, a more advanced hybrid lithography, which combines multiple patterning and e-beam lithography (EBL), is promising to further enhance the pattern resolution. In this paper, we formulate the layout decomposition problem for this hybrid lithography as a minimum vertex deletion K-partition problem, where K is the number of masks in multiple patterning. Stitch minimization and EBL throughput are considered uniformly by adding a virtual vertex between two feature vertices for each stitch candidate during the conflict graph construction phase. For K = 2, we propose a primal-dual method for solving the underlying minimum odd-cycle cover problem efficiently. In addition, a chain decomposition algorithm is employed for removing all 'non-cyclable' edges. For K > 2, we propose a random-initialized local search method that iteratively applies the primal-dual solver. Experimental results show that compared with a two-stage method, our proposed methods reduce the EBL usage by 64.4% with double patterning and 38.7% with triple patterning on average for the benchmarks.

Original languageEnglish (US)
Title of host publication20th Asia and South Pacific Design Automation Conference, ASP-DAC 2015
PublisherInstitute of Electrical and Electronics Engineers Inc.
Pages652-657
Number of pages6
ISBN (Electronic)9781479977925
DOIs
StatePublished - Mar 11 2015
Event2015 20th Asia and South Pacific Design Automation Conference, ASP-DAC 2015 - Chiba, Japan
Duration: Jan 19 2015Jan 22 2015

Publication series

Name20th Asia and South Pacific Design Automation Conference, ASP-DAC 2015

Other

Other2015 20th Asia and South Pacific Design Automation Conference, ASP-DAC 2015
CountryJapan
CityChiba
Period1/19/151/22/15

ASJC Scopus subject areas

  • Computer Science Applications
  • Electrical and Electronic Engineering
  • Control and Systems Engineering
  • Modeling and Simulation

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    Yang, Y., Luk, W. S., Zhou, H., Yan, C., Zeng, X., & Zhou, D. (2015). Layout decomposition co-optimization for hybrid e-beam and multiple patterning lithography. In 20th Asia and South Pacific Design Automation Conference, ASP-DAC 2015 (pp. 652-657). [7059082] (20th Asia and South Pacific Design Automation Conference, ASP-DAC 2015). Institute of Electrical and Electronics Engineers Inc.. https://doi.org/10.1109/ASPDAC.2015.7059082