Abstract
[Figure Presented] Sheltered growth: A novel atomic layer deposition (ALD) method to synthesize highly uniform ultrafine supported metal nanoparticles is described. The ALD process includes growing protected metal nanoparticles and new support layers simultaneously at low temperature. In the final stage, the activation of the metal nanoparticles can be achieved by removing the protective ligands through calcination or reduction at elevated temperature (see picture).
| Original language | English (US) |
|---|---|
| Pages (from-to) | 2547-2551 |
| Number of pages | 5 |
| Journal | Angewandte Chemie - International Edition |
| Volume | 49 |
| Issue number | 14 |
| DOIs | |
| State | Published - Mar 29 2010 |
Keywords
- Atomic layer deposition
- Low-temperature techniques
- Metal nanoparticles
- Palladium
- Supported catalysts
ASJC Scopus subject areas
- General Chemistry
- Catalysis