Low-temperature deposition of diamond films for optical coatings

T. P. Ong*, R. P.H. Chang

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

78 Scopus citations


A low-temperature (≊400°C) plasma-enhanced chemical vapor deposition process has been developed to grow diamond films for optical coatings application. Films with fine grains (≤3000 Å) have been obtained by controlling diamond nucleation. The surface roughness of the films is on the order of 50-200 Å. The optical transparency of the films is over 60% in the range 0.6-2 μm wavelength, which is comparable to that of Type IIa natural diamond. Using a block-on ring tribotester, it is found that the diamond films adhere well to quartz substrates.

Original languageEnglish (US)
Pages (from-to)2063-2065
Number of pages3
JournalApplied Physics Letters
Issue number20
StatePublished - 1989

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

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