Low-temperature magnetron sputter-deposition, hardness, and electrical resistivity of amorphous and crystalline alumina thin films

Quan Li, Yuan Hsin Yu, C. Singh Bhatia, L. D. Marks, S. C. Lee, Y. W. Chung

Research output: Contribution to journalConference articlepeer-review

79 Scopus citations

Abstract

Reactive magnetron sputtering was used to grow alumina thin films. A pulsed direct current bias was applied to the aluminum target and the substrate to maintain a stable deposition process and high deposition rate. Different surface and thin film analysis techniques and electric measurements were done to study the influence of substrate temperature, substrate bias, and the magnetic trap on film growth and properties.

Original languageEnglish (US)
Pages (from-to)2333-2338
Number of pages6
JournalJournal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Volume18
Issue number5
DOIs
StatePublished - Sep 2000
Event47th International Symposium: Vacuum, Thin Films, Surfaces/Interfaces, and Processing - Boston, USA
Duration: Oct 2 2000Oct 6 2000

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films

Fingerprint

Dive into the research topics of 'Low-temperature magnetron sputter-deposition, hardness, and electrical resistivity of amorphous and crystalline alumina thin films'. Together they form a unique fingerprint.

Cite this