Abstract
Reactive magnetron sputtering was used to grow alumina thin films. A pulsed direct current bias was applied to the aluminum target and the substrate to maintain a stable deposition process and high deposition rate. Different surface and thin film analysis techniques and electric measurements were done to study the influence of substrate temperature, substrate bias, and the magnetic trap on film growth and properties.
Original language | English (US) |
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Pages (from-to) | 2333-2338 |
Number of pages | 6 |
Journal | Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films |
Volume | 18 |
Issue number | 5 |
DOIs | |
State | Published - Sep 2000 |
Event | 47th International Symposium: Vacuum, Thin Films, Surfaces/Interfaces, and Processing - Boston, USA Duration: Oct 2 2000 → Oct 6 2000 |
ASJC Scopus subject areas
- Condensed Matter Physics
- Surfaces and Interfaces
- Surfaces, Coatings and Films