Magnetic and structural studies of sputtered Co/Cu multilayer films

J. D. Kim; Amanda K. Petford-Long; J. P. Jakubovics; J. E. Evetts; R. Somekh

doi:10.1063/1.358246

Magnetic and structural studies of sputtered Co/Cu multilayer films

J. D. Kim^*, Amanda K. Petford-Long, J. P. Jakubovics, J. E. Evetts, R. Somekh

^*Corresponding author for this work

Materials Science and Engineering

Research output: Contribution to journal › Article › peer-review

7 Scopus citations

Abstract

The structure and magnetic properties of sputtered Co/Cu multilayer films with various layer thicknesses have been studied. X-ray diffractometry and high resolution electron microscopy show the films to be polycrystalline with a fcc structure and strong [111] texture in the growth direction. The magnetoresistance (MR) of the films depends critically on Cu layer thickness (t_Cu), with maximum values for films with t_Cu around 1 nm. Large differences in saturating field are seen for films with t_Cu and t_Co differing by a nominal 0.1 nm. The magnetic domain structure, studied using Lorentz microscopy, shows strong dependence on t_Cu. High MR-value films showed evidence of antiphase magnetic domain boundaries. The high MR samples show antiferromagnetic coupling, with higher saturating fields than seen in the ferromagnetically coupled films.

Original language	English (US)
Pages (from-to)	6513-6515
Number of pages	3
Journal	Journal of Applied Physics
Volume	76
Issue number	10
DOIs	https://doi.org/10.1063/1.358246
State	Published - 1994

ASJC Scopus subject areas

Physics and Astronomy(all)

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title = "Magnetic and structural studies of sputtered Co/Cu multilayer films",

abstract = "The structure and magnetic properties of sputtered Co/Cu multilayer films with various layer thicknesses have been studied. X-ray diffractometry and high resolution electron microscopy show the films to be polycrystalline with a fcc structure and strong [111] texture in the growth direction. The magnetoresistance (MR) of the films depends critically on Cu layer thickness (tCu), with maximum values for films with tCu around 1 nm. Large differences in saturating field are seen for films with tCu and tCo differing by a nominal 0.1 nm. The magnetic domain structure, studied using Lorentz microscopy, shows strong dependence on tCu. High MR-value films showed evidence of antiphase magnetic domain boundaries. The high MR samples show antiferromagnetic coupling, with higher saturating fields than seen in the ferromagnetically coupled films.",

author = "Kim, {J. D.} and Petford-Long, {Amanda K.} and Jakubovics, {J. P.} and Evetts, {J. E.} and R. Somekh",

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T1 - Magnetic and structural studies of sputtered Co/Cu multilayer films

AU - Kim, J. D.

AU - Petford-Long, Amanda K.

AU - Jakubovics, J. P.

AU - Evetts, J. E.

AU - Somekh, R.

PY - 1994

Y1 - 1994

N2 - The structure and magnetic properties of sputtered Co/Cu multilayer films with various layer thicknesses have been studied. X-ray diffractometry and high resolution electron microscopy show the films to be polycrystalline with a fcc structure and strong [111] texture in the growth direction. The magnetoresistance (MR) of the films depends critically on Cu layer thickness (tCu), with maximum values for films with tCu around 1 nm. Large differences in saturating field are seen for films with tCu and tCo differing by a nominal 0.1 nm. The magnetic domain structure, studied using Lorentz microscopy, shows strong dependence on tCu. High MR-value films showed evidence of antiphase magnetic domain boundaries. The high MR samples show antiferromagnetic coupling, with higher saturating fields than seen in the ferromagnetically coupled films.

AB - The structure and magnetic properties of sputtered Co/Cu multilayer films with various layer thicknesses have been studied. X-ray diffractometry and high resolution electron microscopy show the films to be polycrystalline with a fcc structure and strong [111] texture in the growth direction. The magnetoresistance (MR) of the films depends critically on Cu layer thickness (tCu), with maximum values for films with tCu around 1 nm. Large differences in saturating field are seen for films with tCu and tCo differing by a nominal 0.1 nm. The magnetic domain structure, studied using Lorentz microscopy, shows strong dependence on tCu. High MR-value films showed evidence of antiphase magnetic domain boundaries. The high MR samples show antiferromagnetic coupling, with higher saturating fields than seen in the ferromagnetically coupled films.

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Magnetic and structural studies of sputtered Co/Cu multilayer films

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