Magnetic and structural studies of sputtered Co/Cu multilayer films

J. D. Kim*, Amanda K. Petford-Long, J. P. Jakubovics, J. E. Evetts, R. Somekh

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

7 Scopus citations

Abstract

The structure and magnetic properties of sputtered Co/Cu multilayer films with various layer thicknesses have been studied. X-ray diffractometry and high resolution electron microscopy show the films to be polycrystalline with a fcc structure and strong [111] texture in the growth direction. The magnetoresistance (MR) of the films depends critically on Cu layer thickness (tCu), with maximum values for films with tCu around 1 nm. Large differences in saturating field are seen for films with tCu and tCo differing by a nominal 0.1 nm. The magnetic domain structure, studied using Lorentz microscopy, shows strong dependence on tCu. High MR-value films showed evidence of antiphase magnetic domain boundaries. The high MR samples show antiferromagnetic coupling, with higher saturating fields than seen in the ferromagnetically coupled films.

Original languageEnglish (US)
Pages (from-to)6513-6515
Number of pages3
JournalJournal of Applied Physics
Volume76
Issue number10
DOIs
StatePublished - 1994

ASJC Scopus subject areas

  • Physics and Astronomy(all)

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