Magnetostrictively deforming the surface of a Silicon wafer at two locations

Melville P Ulmer*, R. Coppejans, M. A. Khreishi, K. Keely, D. B. Buchholz, R. Shiri, L. A. Rodriguez, A. E. O'Donnell, Z. J. Shonfeld, W. H. Reinhardt, L. E. Borgsmiller, T. B. Baturalp, V. L. Coverstone, Jian Cao

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

The only way to increase the sensitivity of X-ray telescopes without significantly increasing their size (compared to existing telescopes) is to use thinner mirror shells. However, to maintain the figure of thin mirror shells, their shape will need to be adjusted after they are mounted and/or actively controlled during flight. Here we describe progress toward developing a method that can be used to do both. The core of the concept is to coat thin (< 500 μm) X-ray mirrors with a 10 μm layer of magnetic smart material (MSM). When an external magnetic field is applied to the MSM layer it will expand or contract, changing the shape of the mirror. We have previously demonstrated that this method can be used to generate a single localized deformation on the surface of a test sample. Here we present work to study how two deformations affect each other. The first deformation that we created has a height of 5 μm. The second deformation, generated by applying a magnetic field to the sample 4mm from the first position, has a height of 1 μm. It is likely that the second deformation is smaller than the first because the two areas where the magnetic field was applied were close to each other. This could have caused the MSM to already be partially expanded in the second area when the field was applied there.

Original languageEnglish (US)
Title of host publicationAdaptive X-Ray Optics V
EditorsDaniele Spiga, Hidekazu Mimura, Daniele Spiga
PublisherSPIE
ISBN (Electronic)9781510620933
DOIs
StatePublished - Jan 1 2018
EventAdaptive X-Ray Optics V 2018 - San Diego, United States
Duration: Aug 21 2018 → …

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
Volume10761
ISSN (Print)0277-786X
ISSN (Electronic)1996-756X

Other

OtherAdaptive X-Ray Optics V 2018
CountryUnited States
CitySan Diego
Period8/21/18 → …

Fingerprint

Silicon wafers
Wafer
Silicon
Smart Materials
smart materials
Intelligent materials
wafers
Magnetic materials
mirrors
silicon
Mirror
Mirrors
Magnetic Field
Magnetic fields
Telescopes
Shell
magnetic fields
telescopes
X-ray Mirror
X-ray Telescopes

Keywords

  • Grazing incidence optics
  • Magnetic smart materials
  • Silicon
  • X-ray optics

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

Cite this

Ulmer, M. P., Coppejans, R., Khreishi, M. A., Keely, K., Buchholz, D. B., Shiri, R., ... Cao, J. (2018). Magnetostrictively deforming the surface of a Silicon wafer at two locations. In D. Spiga, H. Mimura, & D. Spiga (Eds.), Adaptive X-Ray Optics V [107610B] (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 10761). SPIE. https://doi.org/10.1117/12.2322511
Ulmer, Melville P ; Coppejans, R. ; Khreishi, M. A. ; Keely, K. ; Buchholz, D. B. ; Shiri, R. ; Rodriguez, L. A. ; O'Donnell, A. E. ; Shonfeld, Z. J. ; Reinhardt, W. H. ; Borgsmiller, L. E. ; Baturalp, T. B. ; Coverstone, V. L. ; Cao, Jian. / Magnetostrictively deforming the surface of a Silicon wafer at two locations. Adaptive X-Ray Optics V. editor / Daniele Spiga ; Hidekazu Mimura ; Daniele Spiga. SPIE, 2018. (Proceedings of SPIE - The International Society for Optical Engineering).
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author = "Ulmer, {Melville P} and R. Coppejans and Khreishi, {M. A.} and K. Keely and Buchholz, {D. B.} and R. Shiri and Rodriguez, {L. A.} and O'Donnell, {A. E.} and Shonfeld, {Z. J.} and Reinhardt, {W. H.} and Borgsmiller, {L. E.} and Baturalp, {T. B.} and Coverstone, {V. L.} and Jian Cao",
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Ulmer, MP, Coppejans, R, Khreishi, MA, Keely, K, Buchholz, DB, Shiri, R, Rodriguez, LA, O'Donnell, AE, Shonfeld, ZJ, Reinhardt, WH, Borgsmiller, LE, Baturalp, TB, Coverstone, VL & Cao, J 2018, Magnetostrictively deforming the surface of a Silicon wafer at two locations. in D Spiga, H Mimura & D Spiga (eds), Adaptive X-Ray Optics V., 107610B, Proceedings of SPIE - The International Society for Optical Engineering, vol. 10761, SPIE, Adaptive X-Ray Optics V 2018, San Diego, United States, 8/21/18. https://doi.org/10.1117/12.2322511

Magnetostrictively deforming the surface of a Silicon wafer at two locations. / Ulmer, Melville P; Coppejans, R.; Khreishi, M. A.; Keely, K.; Buchholz, D. B.; Shiri, R.; Rodriguez, L. A.; O'Donnell, A. E.; Shonfeld, Z. J.; Reinhardt, W. H.; Borgsmiller, L. E.; Baturalp, T. B.; Coverstone, V. L.; Cao, Jian.

Adaptive X-Ray Optics V. ed. / Daniele Spiga; Hidekazu Mimura; Daniele Spiga. SPIE, 2018. 107610B (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 10761).

Research output: Chapter in Book/Report/Conference proceedingConference contribution

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AU - Ulmer, Melville P

AU - Coppejans, R.

AU - Khreishi, M. A.

AU - Keely, K.

AU - Buchholz, D. B.

AU - Shiri, R.

AU - Rodriguez, L. A.

AU - O'Donnell, A. E.

AU - Shonfeld, Z. J.

AU - Reinhardt, W. H.

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KW - Grazing incidence optics

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Ulmer MP, Coppejans R, Khreishi MA, Keely K, Buchholz DB, Shiri R et al. Magnetostrictively deforming the surface of a Silicon wafer at two locations. In Spiga D, Mimura H, Spiga D, editors, Adaptive X-Ray Optics V. SPIE. 2018. 107610B. (Proceedings of SPIE - The International Society for Optical Engineering). https://doi.org/10.1117/12.2322511