Abstract
The current nano-technology revolution is facing several major challenges: to manufacture nanodevices below 20 nm, to fabricate three-dimensional complex nano-structures, and to heterogeneously integrate multiple functionalities. To tackle these grand challenges, the Center for Scalable and Integrated NAno-Manufacturing (SINAM), a NSF Nanoscale Science and Engineering Center, set its goal to establish a new manufacturing paradigm that integrates an array of new nano-manufacturing technologies, including the plasmonic imaging lithography and ultramolding imprint lithography aiming toward critical resolution of 1-10 nm and the hybrid top-down and bottom-up technologies to achieve massively parallel integration of heterogeneous nanoscale components into higher-order structures and devices. Furthermore, SINAM will develop system engineering strategies to scale-up the nano-manufacturing technologies. SINAMs integrated research and education platform will shed light to a broad range of potential applications in computing, telecommunication, photonics, biotechnology, health care, and national security.
Original language | English (US) |
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Pages (from-to) | 125-130 |
Number of pages | 6 |
Journal | Journal of Nanoparticle Research |
Volume | 6 |
Issue number | 1 |
DOIs | |
State | Published - Feb 2004 |
Funding
The Center for Scalable and Integrated Nano-manufacturing is supported by National Science Foundation under the Nanoscale Science and Engineering Center program (DMI0327077).
Keywords
- Hybrid top-down and bottom-up process
- Manufacturing
- Nanoscale
- Plasmonic imaging lithography
- System engineering
- Ultra-molding and imprinting
ASJC Scopus subject areas
- General Chemistry
- Condensed Matter Physics
- Bioengineering
- Atomic and Molecular Physics, and Optics
- General Materials Science
- Modeling and Simulation