Massively parallel dip-pen nanolithography with 55 000-pen two-dimensional arrays

Khalid Salaita*, Yuhuang Wang, Joseph Fragala, Rafael A. Vega, Chang Liu, Chad A. Mirkin

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

262 Scopus citations

Abstract

(Figure Presented) Lots of writing on the wall: A simple and flexible approach for performing high-throughput, large-area, direct-write molecular patterning, without tip feedback, is demonstrated by using a 55 000-pen two-dimensional array of atomic force microscope (AFM) cantilevers. The use of low-aspect-ratio pyramidal tips, curved cantilevers, and a novel gravity-driven alignment method allows parallel patterning of molecules across 1-cm2 substrate areas at sub-100-nm resolution.

Original languageEnglish (US)
Pages (from-to)7220-7223
Number of pages4
JournalAngewandte Chemie - International Edition
Volume45
Issue number43
DOIs
StatePublished - Nov 3 2006

Keywords

  • Dip-pen nanolithography
  • Lithography
  • Nanofabrication
  • Parallelization
  • Scanning probe

ASJC Scopus subject areas

  • Catalysis
  • Chemistry(all)

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