TY - JOUR
T1 - Materials for Superconducting Electronics
T2 - In Situ Growth of Prgao3Thin Films by Metalorganic Chemical Vapor Deposition
AU - Han, Bin
AU - Neumayer, Deborah A.
AU - Schulz, Douglas L.
AU - Hinds, Bruce J.
AU - Marks, Tobin J.
PY - 1993/7
Y1 - 1993/7
N2 - Phase-pure thin films of the YBCO, BSCCO, TBCCO lattice-matched and low dielectric-loss perovskite insulator PrGaO3 have been grown in situ on single-crystal (110) LaA1O3, (001) SrTiG3, and (001) MgO substrates by metalorganic chemical vapor deposition (MOCVD). Films were grown at temperatures between 750 and 800 °C using the volatile metaiorganic /?-diketonate precursors M(dpm)3 (M = Pr, Ga, and dpm = dipivaloylmethanate) As assessed by x-ray diffraction, the films grow epitaxially on LaAlQ3 and SrTiO3 substrates with a high degree of (001) and/or (110) plane orientation parallel to the substrate surface. The films grown on MgO substrates are polycrystalline. Scanning electron microscopy reveals that the MOCVD-derived PrGaO3 films have smooth, featureless surfaces on all three kinds of substrates.
AB - Phase-pure thin films of the YBCO, BSCCO, TBCCO lattice-matched and low dielectric-loss perovskite insulator PrGaO3 have been grown in situ on single-crystal (110) LaA1O3, (001) SrTiG3, and (001) MgO substrates by metalorganic chemical vapor deposition (MOCVD). Films were grown at temperatures between 750 and 800 °C using the volatile metaiorganic /?-diketonate precursors M(dpm)3 (M = Pr, Ga, and dpm = dipivaloylmethanate) As assessed by x-ray diffraction, the films grow epitaxially on LaAlQ3 and SrTiO3 substrates with a high degree of (001) and/or (110) plane orientation parallel to the substrate surface. The films grown on MgO substrates are polycrystalline. Scanning electron microscopy reveals that the MOCVD-derived PrGaO3 films have smooth, featureless surfaces on all three kinds of substrates.
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U2 - 10.1116/1.578568
DO - 10.1116/1.578568
M3 - Article
AN - SCOPUS:84911804683
SN - 0734-2101
VL - 11
SP - 1431
EP - 1434
JO - Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
JF - Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
IS - 4
ER -