INIS
films
100%
substrates
100%
chemical vapor deposition
60%
surfaces
40%
precursor
40%
magnesium oxides
40%
scanning electron microscopy
20%
growth
20%
thin films
20%
single crystals
20%
x-ray diffraction
20%
losses
20%
orientation
20%
dielectrics
20%
volatility
20%
epitaxy
20%
polycrystals
20%
perovskite
20%
Material Science
Liquid Films
80%
Magnesium Oxide
80%
Perovskites
40%
Surface
40%
Thin Films
20%
Single Crystal
20%
Material
20%
Electronics
20%
Chemistry
Liquid Film
80%
Metallorganic Chemical Vapor Deposition
60%
Surface
40%
Single Crystalline Solid
20%
Scanning Electron Microscopy
20%
Nonconductor
20%
Dielectric Loss
20%
Purity
20%
Reaction Temperature
20%
Biochemistry, Genetics and Molecular Biology
Vapor
60%
Precursor
40%
Surface Property
40%
X Ray Diffraction
20%
Growth
20%
Scanning Electron Microscopy
20%
Temperature
20%
Single Crystal
20%
Perovskite
20%