Matrials science: On-wire lithography

Lidong Qin, Sungho Park, Ling Huang, Chad A. Mirkin*

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

313 Scopus citations

Abstract

We report a high-throughput procedure for lithographically processing one-dimensional nanowires. This procedure, termed on-wire lithography, combines advances in template-directed synthesis of nanowires with electrochemical deposition and wet-chemical etching and allows routine fabrication of face-to-face disk arrays and gap structures in the range of five to several hundred nanometers. We studied the transport properties of 13-nanometer gaps with and without nanoscopic amounts of conducting polymers deposited within by dip-pen nanolithography.

Original languageEnglish (US)
Pages (from-to)113-115
Number of pages3
JournalScience
Volume309
Issue number5731
DOIs
StatePublished - Jul 1 2005

ASJC Scopus subject areas

  • General

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