Measurements of thickness, surface roughness and corrosion performance of 1-10 NM thick CNx films

Dejun Li; Yanfeng Chen; Yip Wah Chung

doi:10.1115/2003-trib-344

Measurements of thickness, surface roughness and corrosion performance of 1-10 NM thick CN_x films

Dejun Li, Yanfeng Chen, Yip Wah Chung^*

^*Corresponding author for this work

Materials Science and Engineering

Research output: Contribution to conference › Paper › peer-review

Abstract

Nitrogenated carbon (CN_x) films were synthesized by using pulsed dc magnetron sputtering. When grown with substrate tilt of 45° and rotation speed of 20-25 rpm, the rootmean-square surface roughness is ∼0.3 nm when sampled over 20×20 μm² areas, increasing to ∼0.4 nm when sampled over ∼0.05×3 cm² using x-ray reflectivity measurements. X-ray reflectivity measurements showed that the mass density of these CN_x films is ∼2.0 gm/cc, independent of film thickness from ∼1 to 10 nm, consistent with ion beam analysis. CN_x films deposited with substrate tilt of 45° and rotation speed of 20-25 rpm have about 1/3 fewer corrosion spots per unit area than those without. Reducing CN_x thickness from 3 to 1 nm results in marked increase in corrosion currents.

Original language	English (US)
Pages	99-102
Number of pages	4
DOIs	https://doi.org/10.1115/2003-trib-344
State	Published - 2003
Event	STLE/ASME Joint International Tribology Conference and Exhibition - Ponte Vedra Beach, FL, United States Duration: Oct 27 2003 → Oct 29 2003

Other

Other	STLE/ASME Joint International Tribology Conference and Exhibition
Country/Territory	United States
City	Ponte Vedra Beach, FL
Period	10/27/03 → 10/29/03

ASJC Scopus subject areas

Engineering(all)

Access to Document

10.1115/2003-trib-344

Cite this

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title = "Measurements of thickness, surface roughness and corrosion performance of 1-10 NM thick CNx films",

abstract = "Nitrogenated carbon (CNx) films were synthesized by using pulsed dc magnetron sputtering. When grown with substrate tilt of 45° and rotation speed of 20-25 rpm, the rootmean-square surface roughness is ∼0.3 nm when sampled over 20×20 μm2 areas, increasing to ∼0.4 nm when sampled over ∼0.05×3 cm2 using x-ray reflectivity measurements. X-ray reflectivity measurements showed that the mass density of these CNx films is ∼2.0 gm/cc, independent of film thickness from ∼1 to 10 nm, consistent with ion beam analysis. CNx films deposited with substrate tilt of 45° and rotation speed of 20-25 rpm have about 1/3 fewer corrosion spots per unit area than those without. Reducing CNx thickness from 3 to 1 nm results in marked increase in corrosion currents.",

author = "Dejun Li and Yanfeng Chen and Chung, {Yip Wah}",

year = "2003",

doi = "10.1115/2003-trib-344",

language = "English (US)",

pages = "99--102",

note = "STLE/ASME Joint International Tribology Conference and Exhibition ; Conference date: 27-10-2003 Through 29-10-2003",

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AU - Li, Dejun

AU - Chen, Yanfeng

AU - Chung, Yip Wah

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Y1 - 2003

N2 - Nitrogenated carbon (CNx) films were synthesized by using pulsed dc magnetron sputtering. When grown with substrate tilt of 45° and rotation speed of 20-25 rpm, the rootmean-square surface roughness is ∼0.3 nm when sampled over 20×20 μm2 areas, increasing to ∼0.4 nm when sampled over ∼0.05×3 cm2 using x-ray reflectivity measurements. X-ray reflectivity measurements showed that the mass density of these CNx films is ∼2.0 gm/cc, independent of film thickness from ∼1 to 10 nm, consistent with ion beam analysis. CNx films deposited with substrate tilt of 45° and rotation speed of 20-25 rpm have about 1/3 fewer corrosion spots per unit area than those without. Reducing CNx thickness from 3 to 1 nm results in marked increase in corrosion currents.

AB - Nitrogenated carbon (CNx) films were synthesized by using pulsed dc magnetron sputtering. When grown with substrate tilt of 45° and rotation speed of 20-25 rpm, the rootmean-square surface roughness is ∼0.3 nm when sampled over 20×20 μm2 areas, increasing to ∼0.4 nm when sampled over ∼0.05×3 cm2 using x-ray reflectivity measurements. X-ray reflectivity measurements showed that the mass density of these CNx films is ∼2.0 gm/cc, independent of film thickness from ∼1 to 10 nm, consistent with ion beam analysis. CNx films deposited with substrate tilt of 45° and rotation speed of 20-25 rpm have about 1/3 fewer corrosion spots per unit area than those without. Reducing CNx thickness from 3 to 1 nm results in marked increase in corrosion currents.

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