Mechanism for Al2O3 Atomic Layer Deposition on LiMn2O4 from In Situ Measurements and Ab Initio Calculations

Lin Chen, Robert E. Warburton, Kan Sheng Chen, Joseph A. Libera, Christopher Johnson, Zhenzhen Yang, Mark C. Hersam, Jeffrey P. Greeley*, Jeffrey W. Elam

*Corresponding author for this work

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