Mechanism for Al2O3 Atomic Layer Deposition on LiMn2O4 from In Situ Measurements and Ab Initio Calculations

Lin Chen, Robert E. Warburton, Kan Sheng Chen, Joseph A. Libera, Christopher Johnson, Zhenzhen Yang, Mark C. Hersam, Jeffrey P. Greeley*, Jeffrey W. Elam

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

44 Scopus citations

Fingerprint

Dive into the research topics of 'Mechanism for Al2O3 Atomic Layer Deposition on LiMn2O4 from In Situ Measurements and Ab Initio Calculations'. Together they form a unique fingerprint.

INIS

Material Science