Metal-organic chemical vapor deposition/open flow thallium annealing route to epitaxial Tl2Ba2Ca2Cu3O 10 thin films

B. J. Hinds*, D. L. Schulz, D. A. Neumayer, B. Han, T. J. Marks, Y. Y. Wang, V. P. Dravid, J. L. Schindler, T. P. Hogan, C. R. Kannewurf

*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

21 Scopus citations

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Material Science

Chemical Engineering