Metal-Organic Framework Thin Films as Platforms for Atomic Layer Deposition of Cobalt Ions to Enable Electrocatalytic Water Oxidation

Chung Wei Kung; Joseph E. Mondloch; Timothy C. Wang; Wojciech Bury; William Hoffeditz; Benjamin M. Klahr; Rachel C. Klet; Michael J. Pellin; Omar k Farha; Joseph T Hupp

doi:10.1021/acsami.5b06901

Metal-Organic Framework Thin Films as Platforms for Atomic Layer Deposition of Cobalt Ions to Enable Electrocatalytic Water Oxidation

Chung Wei Kung, Joseph E. Mondloch, Timothy C. Wang, Wojciech Bury, William Hoffeditz, Benjamin M. Klahr, Rachel C. Klet, Michael J. Pellin, Omar k Farha^*, Joseph T Hupp

^*Corresponding author for this work

Chemistry

Research output: Contribution to journal › Article › peer-review

142 Scopus citations

Abstract

Thin films of the metal-organic framework (MOF) NU-1000 were grown on conducting glass substrates. The films uniformly cover the conducting glass substrates and are composed of free-standing sub-micrometer rods. Subsequently, atomic layer deposition (ALD) was utilized to deposit Co²⁺ ions throughout the entire MOF film via self-limiting surface-mediated reaction chemistry. The Co ions bind at aqua and hydroxo sites lining the channels of NU-1000, resulting in three-dimensional arrays of separated Co ions in the MOF thin film. The Co-modified MOF thin films demonstrate promising electrocatalytic activity for water oxidation.

Original language	English (US)
Pages (from-to)	28223-28230
Number of pages	8
Journal	ACS Applied Materials and Interfaces
Volume	7
Issue number	51
DOIs	https://doi.org/10.1021/acsami.5b06901
State	Published - Dec 30 2015

Keywords

atomic layer deposition
cobalt oxide
electrocatalyst
metal-organic frameworks
pyrene
water oxidation

ASJC Scopus subject areas

General Materials Science

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10.1021/acsami.5b06901

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Kung, C. W., Mondloch, J. E., Wang, T. C., Bury, W., Hoffeditz, W., Klahr, B. M., Klet, R. C., Pellin, M. J., Farha, O. K., & Hupp, J. T. (2015). Metal-Organic Framework Thin Films as Platforms for Atomic Layer Deposition of Cobalt Ions to Enable Electrocatalytic Water Oxidation. ACS Applied Materials and Interfaces, 7(51), 28223-28230. https://doi.org/10.1021/acsami.5b06901

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title = "Metal-Organic Framework Thin Films as Platforms for Atomic Layer Deposition of Cobalt Ions to Enable Electrocatalytic Water Oxidation",

abstract = "Thin films of the metal-organic framework (MOF) NU-1000 were grown on conducting glass substrates. The films uniformly cover the conducting glass substrates and are composed of free-standing sub-micrometer rods. Subsequently, atomic layer deposition (ALD) was utilized to deposit Co2+ ions throughout the entire MOF film via self-limiting surface-mediated reaction chemistry. The Co ions bind at aqua and hydroxo sites lining the channels of NU-1000, resulting in three-dimensional arrays of separated Co ions in the MOF thin film. The Co-modified MOF thin films demonstrate promising electrocatalytic activity for water oxidation.",

keywords = "atomic layer deposition, cobalt oxide, electrocatalyst, metal-organic frameworks, pyrene, water oxidation",

author = "Kung, {Chung Wei} and Mondloch, {Joseph E.} and Wang, {Timothy C.} and Wojciech Bury and William Hoffeditz and Klahr, {Benjamin M.} and Klet, {Rachel C.} and Pellin, {Michael J.} and Farha, {Omar k} and Hupp, {Joseph T}",

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doi = "10.1021/acsami.5b06901",

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AU - Kung, Chung Wei

AU - Mondloch, Joseph E.

AU - Wang, Timothy C.

AU - Bury, Wojciech

AU - Hoffeditz, William

AU - Klahr, Benjamin M.

AU - Klet, Rachel C.

AU - Pellin, Michael J.

AU - Farha, Omar k

AU - Hupp, Joseph T

PY - 2015/12/30

Y1 - 2015/12/30

N2 - Thin films of the metal-organic framework (MOF) NU-1000 were grown on conducting glass substrates. The films uniformly cover the conducting glass substrates and are composed of free-standing sub-micrometer rods. Subsequently, atomic layer deposition (ALD) was utilized to deposit Co2+ ions throughout the entire MOF film via self-limiting surface-mediated reaction chemistry. The Co ions bind at aqua and hydroxo sites lining the channels of NU-1000, resulting in three-dimensional arrays of separated Co ions in the MOF thin film. The Co-modified MOF thin films demonstrate promising electrocatalytic activity for water oxidation.

AB - Thin films of the metal-organic framework (MOF) NU-1000 were grown on conducting glass substrates. The films uniformly cover the conducting glass substrates and are composed of free-standing sub-micrometer rods. Subsequently, atomic layer deposition (ALD) was utilized to deposit Co2+ ions throughout the entire MOF film via self-limiting surface-mediated reaction chemistry. The Co ions bind at aqua and hydroxo sites lining the channels of NU-1000, resulting in three-dimensional arrays of separated Co ions in the MOF thin film. The Co-modified MOF thin films demonstrate promising electrocatalytic activity for water oxidation.

KW - atomic layer deposition

KW - cobalt oxide

KW - electrocatalyst

KW - metal-organic frameworks

KW - pyrene

KW - water oxidation

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JO - ACS Applied Materials and Interfaces

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Metal-Organic Framework Thin Films as Platforms for Atomic Layer Deposition of Cobalt Ions to Enable Electrocatalytic Water Oxidation

Abstract

Keywords

ASJC Scopus subject areas

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