Keyphrases
Metal-organic Chemical Vapor Deposition (MOCVD)
100%
GaN Thin Film
100%
Monocrystalline
100%
LiGaO2
100%
Scanning Electron Microscopy
50%
Diffraction
50%
Optical Properties
50%
Structural Properties
50%
Photoluminescence
50%
Electrical Properties
50%
Crystal Quality
50%
Hall Measurement
50%
Growth Temperature
50%
Chemical Vapor Deposition Growth
50%
Optical Transmission
50%
Engineering
Monocrystalline
100%
Thin Films
100%
Chemical Vapor Deposition
100%
Vapor Deposition
100%
Crystal Quality
50%
Ray Diffraction
50%
Growth Temperature
50%
Optical Transmission
50%
Material Science
Chemical Vapor Deposition
100%
Thin Films
100%
Optical Measurement
50%
Scanning Electron Microscopy
50%
Photoluminescence
50%
Film
50%
Optical Property
50%
Physics
Thin Films
100%
Metalorganic Chemical Vapor Deposition
100%
Optical Measurement
50%
Scanning Electron Microscopy
50%
Optical Property
50%
Photoluminescence
50%
Electrical Property
50%