Metrology of 1-10 nm thick CNx films: Thickness, density, and surface roughness measurements

Dejun Li; Yanfeng Chen; Yip Wah Chung; Fernando Lazaro Freire

doi:10.1116/1.1603278

Metrology of 1-10 nm thick CN_x films: Thickness, density, and surface roughness measurements

Dejun Li^*, Yanfeng Chen, Yip Wah Chung, Fernando Lazaro Freire

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

3 Scopus citations

Abstract

The synthesis of ultrathin nitrogenated carbon (CN_x) films was discussed. The pulsed dc magnetron sputtering was used for the synthesis. The influence of substrate tilt angle and rotation speed on surface roughness was also explored.

Original language	English (US)
Pages (from-to)	L19-L21
Journal	Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Volume	21
Issue number	5
DOIs	https://doi.org/10.1116/1.1603278
State	Published - Sep 2003

ASJC Scopus subject areas

Condensed Matter Physics
Surfaces and Interfaces
Surfaces, Coatings and Films

Access to Document

10.1116/1.1603278

Cite this

@article{75584877b880455db897aab6f3b8d6a2,

title = "Metrology of 1-10 nm thick CNx films: Thickness, density, and surface roughness measurements",

abstract = "The synthesis of ultrathin nitrogenated carbon (CNx) films was discussed. The pulsed dc magnetron sputtering was used for the synthesis. The influence of substrate tilt angle and rotation speed on surface roughness was also explored.",

author = "Dejun Li and Yanfeng Chen and Chung, {Yip Wah} and Freire, {Fernando Lazaro}",

year = "2003",

month = sep,

doi = "10.1116/1.1603278",

language = "English (US)",

volume = "21",

pages = "L19--L21",

journal = "Journal of Vacuum Science and Technology A",

issn = "0734-2101",

publisher = "AVS Science and Technology Society",

number = "5",

}

TY - JOUR

T1 - Metrology of 1-10 nm thick CNx films

T2 - Thickness, density, and surface roughness measurements

AU - Li, Dejun

AU - Chen, Yanfeng

AU - Chung, Yip Wah

AU - Freire, Fernando Lazaro

PY - 2003/9

Y1 - 2003/9

N2 - The synthesis of ultrathin nitrogenated carbon (CNx) films was discussed. The pulsed dc magnetron sputtering was used for the synthesis. The influence of substrate tilt angle and rotation speed on surface roughness was also explored.

AB - The synthesis of ultrathin nitrogenated carbon (CNx) films was discussed. The pulsed dc magnetron sputtering was used for the synthesis. The influence of substrate tilt angle and rotation speed on surface roughness was also explored.

UR - http://www.scopus.com/inward/record.url?scp=0142059019&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0142059019&partnerID=8YFLogxK

U2 - 10.1116/1.1603278

DO - 10.1116/1.1603278

M3 - Article

AN - SCOPUS:0142059019

SN - 0734-2101

VL - 21

SP - L19-L21

JO - Journal of Vacuum Science and Technology A

JF - Journal of Vacuum Science and Technology A

IS - 5

ER -

Metrology of 1-10 nm thick CN_x films: Thickness, density, and surface roughness measurements

Abstract

ASJC Scopus subject areas

Access to Document

Other files and links

Fingerprint

Cite this