Microelectronic film thickness determination using a laser-based ultrasonic technique

R. Logan*, A. A. Maznev, K. A. Nelson, J. A. Rogers, M. Fuchs, M. Banet

*Corresponding author for this work

Research output: Contribution to journalConference articlepeer-review

Abstract

A non-contact and non-destructive laser-based acoustic technique called impulsive stimulated thermal scattering (ISTS) is used to measure thicknesses of films in single-layer and multilayer assemblies such as W/Si, Ti/Si, and Ti/SiO2/Si structures. Thicknesses are determined to within a few percent accuracy with a laboratory version of the measurement apparatus, using conventional large-frame lasers and optics, and in a commercial prototype using compact diode-pumped and diode lasers and optics which all fit onto a 1-ft×2-ft breadboard. ISTS and conventional measurements (profilometry, SEM, and 4-point resistance) are made on the same samples and the results are found to compare favorably.

Original languageEnglish (US)
Pages (from-to)347-352
Number of pages6
JournalMaterials Research Society Symposium - Proceedings
Volume440
StatePublished - Dec 1 1997
EventProceedings of the 1996 MRS Fall Symposium - Boston, MA, USA
Duration: Dec 2 1996Dec 6 1996

ASJC Scopus subject areas

  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering

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