Microfluidic method for in-situ deposition and precision patterning of thin-film metals on curved surfaces

Edgar D. Goluch, Kashan A. Shaikh, Kee Ryu, Jack Chen, Jonathan Engel, Chang Liu*

*Corresponding author for this work

Research output: Contribution to journalArticle

26 Scopus citations

Abstract

We present a technique for patterning thin-film metals (silver and gold) without the need for photolithography. The technique involves microfluidics and can be performed on planar or curved surfaces. Patterns of thin-film metal are fabricated by flowing electroless silver or gold plating solutions through predefined microchannels made of polydimethylsiloxane sealed against a surface of interest. We demonstrate metal resistors with 100-μm-wide traces fabricated on planar and curved surfaces. The surface profile, mechanical gauge factor, and temperature coefficient of resistance have been characterized. Application of the resistors as hot-wire flow sensors has also been demonstrated.

Original languageEnglish (US)
Pages (from-to)3629-3631
Number of pages3
JournalApplied Physics Letters
Volume85
Issue number16
DOIs
StatePublished - Oct 18 2004

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

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