Micromachined arrayed dip pen nanolithography probes for sub-100nm direct chemistry patterning

David Bullen*, Xuefeng Wang, Jun Zou, Seunghun Hong, Sung Wook Chung, Kee Ryu, Zhifang Fan, Chad Mirkin, Chang Liu

*Corresponding author for this work

Research output: Contribution to conferencePaper

9 Scopus citations

Abstract

We report the development of micromachined passive and active probe arrays for parallel dip pen nanolithography (DPN). DPN is a soft lithography method that allows direct, mask-less deposition of chemicals onto substrates with sub 100-nm resolution. An active DPN probe with thermal bimetallic actuation has been developed and tested. Lithographic results and an analytical tool for optimizing active probe designs with respect to a number of performance criteria are also demonstrated.

Original languageEnglish (US)
Pages4-7
Number of pages4
StatePublished - Jul 23 2003
EventIEEE Sixteenth Annual International Conference on Micro Electro Mechanical Systems - Kyoto, Japan
Duration: Jan 19 2003Jan 23 2003

Other

OtherIEEE Sixteenth Annual International Conference on Micro Electro Mechanical Systems
CountryJapan
CityKyoto
Period1/19/031/23/03

ASJC Scopus subject areas

  • Control and Systems Engineering
  • Mechanical Engineering
  • Electrical and Electronic Engineering

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    Bullen, D., Wang, X., Zou, J., Hong, S., Chung, S. W., Ryu, K., Fan, Z., Mirkin, C., & Liu, C. (2003). Micromachined arrayed dip pen nanolithography probes for sub-100nm direct chemistry patterning. 4-7. Paper presented at IEEE Sixteenth Annual International Conference on Micro Electro Mechanical Systems, Kyoto, Japan.