Micromachined arrayed dip pen nanolithography probes for sub-100nm direct chemistry patterning

David Bullen*, Xuefeng Wang, Jun Zou, Seunghun Hong, Sung Wook Chung, Kee Ryu, Zhifang Fan, Chad A Mirkin, Chang Liu

*Corresponding author for this work

Research output: Contribution to conferencePaper

9 Citations (Scopus)

Abstract

We report the development of micromachined passive and active probe arrays for parallel dip pen nanolithography (DPN). DPN is a soft lithography method that allows direct, mask-less deposition of chemicals onto substrates with sub 100-nm resolution. An active DPN probe with thermal bimetallic actuation has been developed and tested. Lithographic results and an analytical tool for optimizing active probe designs with respect to a number of performance criteria are also demonstrated.

Original languageEnglish (US)
Pages4-7
Number of pages4
StatePublished - Jul 23 2003
EventIEEE Sixteenth Annual International Conference on Micro Electro Mechanical Systems - Kyoto, Japan
Duration: Jan 19 2003Jan 23 2003

Other

OtherIEEE Sixteenth Annual International Conference on Micro Electro Mechanical Systems
CountryJapan
CityKyoto
Period1/19/031/23/03

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Nanolithography
Lithography
Masks
Substrates

ASJC Scopus subject areas

  • Control and Systems Engineering
  • Mechanical Engineering
  • Electrical and Electronic Engineering

Cite this

Bullen, D., Wang, X., Zou, J., Hong, S., Chung, S. W., Ryu, K., ... Liu, C. (2003). Micromachined arrayed dip pen nanolithography probes for sub-100nm direct chemistry patterning. 4-7. Paper presented at IEEE Sixteenth Annual International Conference on Micro Electro Mechanical Systems, Kyoto, Japan.
Bullen, David ; Wang, Xuefeng ; Zou, Jun ; Hong, Seunghun ; Chung, Sung Wook ; Ryu, Kee ; Fan, Zhifang ; Mirkin, Chad A ; Liu, Chang. / Micromachined arrayed dip pen nanolithography probes for sub-100nm direct chemistry patterning. Paper presented at IEEE Sixteenth Annual International Conference on Micro Electro Mechanical Systems, Kyoto, Japan.4 p.
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abstract = "We report the development of micromachined passive and active probe arrays for parallel dip pen nanolithography (DPN). DPN is a soft lithography method that allows direct, mask-less deposition of chemicals onto substrates with sub 100-nm resolution. An active DPN probe with thermal bimetallic actuation has been developed and tested. Lithographic results and an analytical tool for optimizing active probe designs with respect to a number of performance criteria are also demonstrated.",
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Bullen, D, Wang, X, Zou, J, Hong, S, Chung, SW, Ryu, K, Fan, Z, Mirkin, CA & Liu, C 2003, 'Micromachined arrayed dip pen nanolithography probes for sub-100nm direct chemistry patterning' Paper presented at IEEE Sixteenth Annual International Conference on Micro Electro Mechanical Systems, Kyoto, Japan, 1/19/03 - 1/23/03, pp. 4-7.

Micromachined arrayed dip pen nanolithography probes for sub-100nm direct chemistry patterning. / Bullen, David; Wang, Xuefeng; Zou, Jun; Hong, Seunghun; Chung, Sung Wook; Ryu, Kee; Fan, Zhifang; Mirkin, Chad A; Liu, Chang.

2003. 4-7 Paper presented at IEEE Sixteenth Annual International Conference on Micro Electro Mechanical Systems, Kyoto, Japan.

Research output: Contribution to conferencePaper

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T1 - Micromachined arrayed dip pen nanolithography probes for sub-100nm direct chemistry patterning

AU - Bullen, David

AU - Wang, Xuefeng

AU - Zou, Jun

AU - Hong, Seunghun

AU - Chung, Sung Wook

AU - Ryu, Kee

AU - Fan, Zhifang

AU - Mirkin, Chad A

AU - Liu, Chang

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N2 - We report the development of micromachined passive and active probe arrays for parallel dip pen nanolithography (DPN). DPN is a soft lithography method that allows direct, mask-less deposition of chemicals onto substrates with sub 100-nm resolution. An active DPN probe with thermal bimetallic actuation has been developed and tested. Lithographic results and an analytical tool for optimizing active probe designs with respect to a number of performance criteria are also demonstrated.

AB - We report the development of micromachined passive and active probe arrays for parallel dip pen nanolithography (DPN). DPN is a soft lithography method that allows direct, mask-less deposition of chemicals onto substrates with sub 100-nm resolution. An active DPN probe with thermal bimetallic actuation has been developed and tested. Lithographic results and an analytical tool for optimizing active probe designs with respect to a number of performance criteria are also demonstrated.

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Bullen D, Wang X, Zou J, Hong S, Chung SW, Ryu K et al. Micromachined arrayed dip pen nanolithography probes for sub-100nm direct chemistry patterning. 2003. Paper presented at IEEE Sixteenth Annual International Conference on Micro Electro Mechanical Systems, Kyoto, Japan.