Micromachined arrayed dip pen nanolithography probes for sub-100nm direct chemistry patterning

David Bullen; Xuefeng Wang; Jun Zou; Seunghun Hong; Sung Wook Chung; Kee Ryu; Zhifang Fan; Chad Mirkin; Chang Liu

Micromachined arrayed dip pen nanolithography probes for sub-100nm direct chemistry patterning

David Bullen^*, Xuefeng Wang, Jun Zou, Seunghun Hong, Sung Wook Chung, Kee Ryu, Zhifang Fan, Chad Mirkin, Chang Liu

^*Corresponding author for this work

Research output: Contribution to conference › Paper › peer-review

9 Scopus citations

Abstract

We report the development of micromachined passive and active probe arrays for parallel dip pen nanolithography (DPN). DPN is a soft lithography method that allows direct, mask-less deposition of chemicals onto substrates with sub 100-nm resolution. An active DPN probe with thermal bimetallic actuation has been developed and tested. Lithographic results and an analytical tool for optimizing active probe designs with respect to a number of performance criteria are also demonstrated.

Original language	English (US)
Pages	4-7
Number of pages	4
State	Published - Jul 23 2003
Event	IEEE Sixteenth Annual International Conference on Micro Electro Mechanical Systems - Kyoto, Japan Duration: Jan 19 2003 → Jan 23 2003

Other

Other	IEEE Sixteenth Annual International Conference on Micro Electro Mechanical Systems
Country/Territory	Japan
City	Kyoto
Period	1/19/03 → 1/23/03

ASJC Scopus subject areas

Control and Systems Engineering
Mechanical Engineering
Electrical and Electronic Engineering

Cite this

@conference{b216470accbe4eaba17ed126aa4b5291,

title = "Micromachined arrayed dip pen nanolithography probes for sub-100nm direct chemistry patterning",

abstract = "We report the development of micromachined passive and active probe arrays for parallel dip pen nanolithography (DPN). DPN is a soft lithography method that allows direct, mask-less deposition of chemicals onto substrates with sub 100-nm resolution. An active DPN probe with thermal bimetallic actuation has been developed and tested. Lithographic results and an analytical tool for optimizing active probe designs with respect to a number of performance criteria are also demonstrated.",

author = "David Bullen and Xuefeng Wang and Jun Zou and Seunghun Hong and Chung, {Sung Wook} and Kee Ryu and Zhifang Fan and Chad Mirkin and Chang Liu",

year = "2003",

month = jul,

day = "23",

language = "English (US)",

pages = "4--7",

note = "IEEE Sixteenth Annual International Conference on Micro Electro Mechanical Systems ; Conference date: 19-01-2003 Through 23-01-2003",

}

TY - CONF

T1 - Micromachined arrayed dip pen nanolithography probes for sub-100nm direct chemistry patterning

AU - Bullen, David

AU - Wang, Xuefeng

AU - Zou, Jun

AU - Hong, Seunghun

AU - Chung, Sung Wook

AU - Ryu, Kee

AU - Fan, Zhifang

AU - Mirkin, Chad

AU - Liu, Chang

PY - 2003/7/23

Y1 - 2003/7/23

N2 - We report the development of micromachined passive and active probe arrays for parallel dip pen nanolithography (DPN). DPN is a soft lithography method that allows direct, mask-less deposition of chemicals onto substrates with sub 100-nm resolution. An active DPN probe with thermal bimetallic actuation has been developed and tested. Lithographic results and an analytical tool for optimizing active probe designs with respect to a number of performance criteria are also demonstrated.

AB - We report the development of micromachined passive and active probe arrays for parallel dip pen nanolithography (DPN). DPN is a soft lithography method that allows direct, mask-less deposition of chemicals onto substrates with sub 100-nm resolution. An active DPN probe with thermal bimetallic actuation has been developed and tested. Lithographic results and an analytical tool for optimizing active probe designs with respect to a number of performance criteria are also demonstrated.

UR - http://www.scopus.com/inward/record.url?scp=0038494625&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0038494625&partnerID=8YFLogxK

M3 - Paper

AN - SCOPUS:0038494625

SP - 4

EP - 7

T2 - IEEE Sixteenth Annual International Conference on Micro Electro Mechanical Systems

Y2 - 19 January 2003 through 23 January 2003

ER -

Micromachined arrayed dip pen nanolithography probes for sub-100nm direct chemistry patterning

Abstract

Other

ASJC Scopus subject areas

Other files and links

Fingerprint

Cite this