TY - JOUR
T1 - Microscale features and surface chemical functionality patterned by electron beam lithography
T2 - A novel route to poly(dimethylsiloxane) (PDMS) stamp fabrication
AU - Russell, Matthew T.
AU - Pingree, Liam S.C.
AU - Hersam, Mark
AU - Marks, Tobin Jay
PY - 2006/7/18
Y1 - 2006/7/18
N2 - Poly(dimethylsiloxane) (PDMS) has become a ubiquitous material for microcontact printing, yet there are few methods available to pattern a completed PDMS stamp in a single step. It is shown here that electron beam lithography (EBL) is effective in writing patterns directly onto cured PDMS stamps, thus overcoming the need for multiple patterning steps. Not only does this method allow the modification of an existing lithographic pattern, but new 3D features such as cones, pits, and channels can also be fabricated. EBL can also be used to fabricate PDMS masks for photolithography whereby 1:1 pattern transfer into a photoresist is achieved. Additionally, direct EBL writing of surface chemical features has been achieved using a PDMS stamp coated with a self-assembled monolayer. An electrostatic mechanism appears to be operative in the EBL patterning process, as supported by calculations, thermogravimetric analysis, time-of-flight secondary ion mass spectroscopy, optical and atomic force microscopy, and chemical functionalization assays.
AB - Poly(dimethylsiloxane) (PDMS) has become a ubiquitous material for microcontact printing, yet there are few methods available to pattern a completed PDMS stamp in a single step. It is shown here that electron beam lithography (EBL) is effective in writing patterns directly onto cured PDMS stamps, thus overcoming the need for multiple patterning steps. Not only does this method allow the modification of an existing lithographic pattern, but new 3D features such as cones, pits, and channels can also be fabricated. EBL can also be used to fabricate PDMS masks for photolithography whereby 1:1 pattern transfer into a photoresist is achieved. Additionally, direct EBL writing of surface chemical features has been achieved using a PDMS stamp coated with a self-assembled monolayer. An electrostatic mechanism appears to be operative in the EBL patterning process, as supported by calculations, thermogravimetric analysis, time-of-flight secondary ion mass spectroscopy, optical and atomic force microscopy, and chemical functionalization assays.
UR - http://www.scopus.com/inward/record.url?scp=33746626357&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=33746626357&partnerID=8YFLogxK
U2 - 10.1021/la060319i
DO - 10.1021/la060319i
M3 - Article
C2 - 16831018
AN - SCOPUS:33746626357
VL - 22
SP - 6712
EP - 6718
JO - Langmuir
JF - Langmuir
SN - 0743-7463
IS - 15
ER -