Microstructural studies of top and bottom magnetic tunnel junctions

X. Portier; A. K. Petford-Long; J. H. Nickel; T. C. Anthony; J. A. Brug

doi:10.1063/1.1381420

Microstructural studies of top and bottom magnetic tunnel junctions

X. Portier^*, A. K. Petford-Long, J. H. Nickel, T. C. Anthony, J. A. Brug

^*Corresponding author for this work

Materials Science and Engineering

Research output: Contribution to journal › Article › peer-review

3 Scopus citations

Abstract

High-resolution electron microscopy has been used to study the microstructural properties of top and bottom magnetic tunnel junctions. Different physical properties have been found for the two configurations, and they have been interpreted in terms of microstructural features. All physical parameters favor the bottom configuration except for the coupling field, which is higher for the bottom structure. This latter result has been explained by the more pronounced roughness at the interfaces between the electrodes and the insulator film.

Original language	English (US)
Pages (from-to)	57-59
Number of pages	3
Journal	Applied Physics Letters
Volume	79
Issue number	1
DOIs	https://doi.org/10.1063/1.1381420
State	Published - Jul 2 2001

ASJC Scopus subject areas

Physics and Astronomy (miscellaneous)

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10.1063/1.1381420

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AU - Brug, J. A.

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