Microstructure array on Si and SiOx generated by micro-contact printing, wet chemical etching and reactive ion etching

Hua Zhang*, Nabil A. Amro, Sandeep Disawal, Robert Elghanian, Roger Shile, Joseph Fragala

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

5 Scopus citations

Abstract

A method, combining micro-contact printing (μCP), wet chemical etching and reactive ion etching (RIE), is reported to fabricate microstructures on Si and SiOx. Positive and negative structures were generated based on different stamps used for μCP. The reproducibility of the obtained microstructures shows the methodology reported herein could be useful in Micro-Electro-Mechanical Systems (MEMS), optical and biological sensing applications.

Original languageEnglish (US)
Pages (from-to)1960-1963
Number of pages4
JournalApplied Surface Science
Volume253
Issue number4
DOIs
StatePublished - Dec 15 2006

Keywords

  • Micro-contact printing
  • Reactive ion etching
  • Silicon
  • Silicon oxide
  • Wet chemical etching

ASJC Scopus subject areas

  • Chemistry(all)
  • Condensed Matter Physics
  • Physics and Astronomy(all)
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films

Fingerprint Dive into the research topics of 'Microstructure array on Si and SiOx generated by micro-contact printing, wet chemical etching and reactive ion etching'. Together they form a unique fingerprint.

Cite this