Microstructure array on Si and SiOx generated by micro-contact printing, wet chemical etching and reactive ion etching

Hua Zhang; Nabil A. Amro; Sandeep Disawal; Robert Elghanian; Roger Shile; Joseph Fragala

doi:10.1016/j.apsusc.2006.03.045

Microstructure array on Si and SiOx generated by micro-contact printing, wet chemical etching and reactive ion etching

Hua Zhang^*, Nabil A. Amro, Sandeep Disawal, Robert Elghanian, Roger Shile, Joseph Fragala

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

6 Scopus citations

Abstract

A method, combining micro-contact printing (μCP), wet chemical etching and reactive ion etching (RIE), is reported to fabricate microstructures on Si and SiOx. Positive and negative structures were generated based on different stamps used for μCP. The reproducibility of the obtained microstructures shows the methodology reported herein could be useful in Micro-Electro-Mechanical Systems (MEMS), optical and biological sensing applications.

Original language	English (US)
Pages (from-to)	1960-1963
Number of pages	4
Journal	Applied Surface Science
Volume	253
Issue number	4
DOIs	https://doi.org/10.1016/j.apsusc.2006.03.045
State	Published - Dec 15 2006
Externally published	Yes

Keywords

Micro-contact printing
Reactive ion etching
Silicon
Silicon oxide
Wet chemical etching

ASJC Scopus subject areas

Chemistry(all)
Condensed Matter Physics
Physics and Astronomy(all)
Surfaces and Interfaces
Surfaces, Coatings and Films

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10.1016/j.apsusc.2006.03.045

Cite this

@article{8454e117c1a540b5a9079b8a4477697b,

title = "Microstructure array on Si and SiOx generated by micro-contact printing, wet chemical etching and reactive ion etching",

abstract = "A method, combining micro-contact printing (μCP), wet chemical etching and reactive ion etching (RIE), is reported to fabricate microstructures on Si and SiOx. Positive and negative structures were generated based on different stamps used for μCP. The reproducibility of the obtained microstructures shows the methodology reported herein could be useful in Micro-Electro-Mechanical Systems (MEMS), optical and biological sensing applications.",

keywords = "Micro-contact printing, Reactive ion etching, Silicon, Silicon oxide, Wet chemical etching",

author = "Hua Zhang and Amro, {Nabil A.} and Sandeep Disawal and Robert Elghanian and Roger Shile and Joseph Fragala",

year = "2006",

month = dec,

day = "15",

doi = "10.1016/j.apsusc.2006.03.045",

language = "English (US)",

volume = "253",

pages = "1960--1963",

journal = "Applied Surface Science",

issn = "0169-4332",

publisher = "Elsevier",

number = "4",

}

TY - JOUR

T1 - Microstructure array on Si and SiOx generated by micro-contact printing, wet chemical etching and reactive ion etching

AU - Zhang, Hua

AU - Amro, Nabil A.

AU - Disawal, Sandeep

AU - Elghanian, Robert

AU - Shile, Roger

AU - Fragala, Joseph

PY - 2006/12/15

Y1 - 2006/12/15

N2 - A method, combining micro-contact printing (μCP), wet chemical etching and reactive ion etching (RIE), is reported to fabricate microstructures on Si and SiOx. Positive and negative structures were generated based on different stamps used for μCP. The reproducibility of the obtained microstructures shows the methodology reported herein could be useful in Micro-Electro-Mechanical Systems (MEMS), optical and biological sensing applications.

AB - A method, combining micro-contact printing (μCP), wet chemical etching and reactive ion etching (RIE), is reported to fabricate microstructures on Si and SiOx. Positive and negative structures were generated based on different stamps used for μCP. The reproducibility of the obtained microstructures shows the methodology reported herein could be useful in Micro-Electro-Mechanical Systems (MEMS), optical and biological sensing applications.

KW - Micro-contact printing

KW - Reactive ion etching

KW - Silicon

KW - Silicon oxide

KW - Wet chemical etching

UR - http://www.scopus.com/inward/record.url?scp=33751207076&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=33751207076&partnerID=8YFLogxK

U2 - 10.1016/j.apsusc.2006.03.045

DO - 10.1016/j.apsusc.2006.03.045

M3 - Article

AN - SCOPUS:33751207076

SN - 0169-4332

VL - 253

SP - 1960

EP - 1963

JO - Applied Surface Science

JF - Applied Surface Science

IS - 4

ER -

Microstructure array on Si and SiOx generated by micro-contact printing, wet chemical etching and reactive ion etching

Abstract

Keywords

ASJC Scopus subject areas

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