TY - JOUR
T1 - Microstructure of cosputter-deposited metal- and oxide-MoS2 solid lubricant thin films
AU - Hilton, M. R.
AU - Jayaram, G.
AU - Marks, L. D.
N1 - Funding Information:
This work was supported by the U.S. Air Force Materiel Command, Space and Missiles Systems Center, under Contract FO4701-93-C-0094 as part of The Aerospace Corporation Mission-Oriented Investigation and Experimentation Program and the U.S. Air Force Office of Scientific Research on Grant F49620-94-1-0164 AFOSR. The authors would like to thank B. C. Stupp, R. Gordman, and T. Schneider (Hohman Plating and Manufacturing, Inc.) for preparing cosputtered Ni-and SbOx – MoS2 films and Paul Adams (Aerospace) for obtaining the XRD data.
PY - 1998/4
Y1 - 1998/4
N2 - The effect of cosputtering small amounts of Ni (3%, 9%) and SbOx (20%) on the final microstructure of MoS2 lubricant thin films has been studied using a combination of scanning and transmission electron microscopy imaging, and electron and x-ray diffraction techniques. The early-growth, near-interface microstructure of both MoS2 and 3% Ni-MoS2 cosputtered films is revealed to be a mixture of (002) basal and elongated, large-size (100) and (110) edge islands. Cosputtering with 9% Ni induces a dramatic change in the microstructure, i.e., primarily basal domains with very small isolated regions of edge islands, while cosputtering with 20% SbOx produces films having no long-range order. The results are compared with and are consistent with previously published x-ray absorption fine structure data. The impact of film morphology on tribological performance is discussed.
AB - The effect of cosputtering small amounts of Ni (3%, 9%) and SbOx (20%) on the final microstructure of MoS2 lubricant thin films has been studied using a combination of scanning and transmission electron microscopy imaging, and electron and x-ray diffraction techniques. The early-growth, near-interface microstructure of both MoS2 and 3% Ni-MoS2 cosputtered films is revealed to be a mixture of (002) basal and elongated, large-size (100) and (110) edge islands. Cosputtering with 9% Ni induces a dramatic change in the microstructure, i.e., primarily basal domains with very small isolated regions of edge islands, while cosputtering with 20% SbOx produces films having no long-range order. The results are compared with and are consistent with previously published x-ray absorption fine structure data. The impact of film morphology on tribological performance is discussed.
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U2 - 10.1557/JMR.1998.0143
DO - 10.1557/JMR.1998.0143
M3 - Article
AN - SCOPUS:0032050761
SN - 0884-2914
VL - 13
SP - 1022
EP - 1032
JO - Journal of Materials Research
JF - Journal of Materials Research
IS - 4
ER -