Microstructure of epitaxial potassium niobate thin films prepared by metalorganic chemical vapor deposition

M. J. Nystrom; B. W. Wessels; J. Chen; T. J. Marks

doi:10.1063/1.116734

Microstructure of epitaxial potassium niobate thin films prepared by metalorganic chemical vapor deposition

M. J. Nystrom^*, B. W. Wessels, J. Chen, T. J. Marks

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

36 Scopus citations

Abstract

The microstructure of (001)p-oriented (subscript p indicates the choice of a pseudocubic unit cell) potassium niobate (KNbO3) thin films grown by metalorganic chemical vapor deposition on (100)p lanthanum aluminate and having a large second-order nonlinear optical response is examined. Transmission electron microscopy reveals the films to be epitaxial and the film/substrate interface to be abrupt and semicoherent. The strain between the film and substrate due to the 5% lattice constant mismatch is accommodated by formation of an array of misfit dislocations as well as 60° and 120° ferroelectric microdomains. The domains are located in a 20 nm thick region adjacent to the interface. Beyond the multidomain region, the film is free of significant defects.

Original language	English (US)
Pages (from-to)	761-763
Number of pages	3
Journal	Applied Physics Letters
Volume	68
Issue number	6
DOIs	https://doi.org/10.1063/1.116734
State	Published - 1996

ASJC Scopus subject areas

Physics and Astronomy (miscellaneous)

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@article{ae15687de3464b589e028f192c6c7658,

title = "Microstructure of epitaxial potassium niobate thin films prepared by metalorganic chemical vapor deposition",

abstract = "The microstructure of (001)p-oriented (subscript p indicates the choice of a pseudocubic unit cell) potassium niobate (KNbO3) thin films grown by metalorganic chemical vapor deposition on (100)p lanthanum aluminate and having a large second-order nonlinear optical response is examined. Transmission electron microscopy reveals the films to be epitaxial and the film/substrate interface to be abrupt and semicoherent. The strain between the film and substrate due to the 5% lattice constant mismatch is accommodated by formation of an array of misfit dislocations as well as 60° and 120° ferroelectric microdomains. The domains are located in a 20 nm thick region adjacent to the interface. Beyond the multidomain region, the film is free of significant defects.",

author = "Nystrom, {M. J.} and Wessels, {B. W.} and J. Chen and Marks, {T. J.}",

year = "1996",

doi = "10.1063/1.116734",

language = "English (US)",

volume = "68",

pages = "761--763",

journal = "Applied Physics Letters",

issn = "0003-6951",

publisher = "American Institute of Physics Publising LLC",

number = "6",

}

TY - JOUR

T1 - Microstructure of epitaxial potassium niobate thin films prepared by metalorganic chemical vapor deposition

AU - Nystrom, M. J.

AU - Wessels, B. W.

AU - Chen, J.

AU - Marks, T. J.

PY - 1996

Y1 - 1996

N2 - The microstructure of (001)p-oriented (subscript p indicates the choice of a pseudocubic unit cell) potassium niobate (KNbO3) thin films grown by metalorganic chemical vapor deposition on (100)p lanthanum aluminate and having a large second-order nonlinear optical response is examined. Transmission electron microscopy reveals the films to be epitaxial and the film/substrate interface to be abrupt and semicoherent. The strain between the film and substrate due to the 5% lattice constant mismatch is accommodated by formation of an array of misfit dislocations as well as 60° and 120° ferroelectric microdomains. The domains are located in a 20 nm thick region adjacent to the interface. Beyond the multidomain region, the film is free of significant defects.

AB - The microstructure of (001)p-oriented (subscript p indicates the choice of a pseudocubic unit cell) potassium niobate (KNbO3) thin films grown by metalorganic chemical vapor deposition on (100)p lanthanum aluminate and having a large second-order nonlinear optical response is examined. Transmission electron microscopy reveals the films to be epitaxial and the film/substrate interface to be abrupt and semicoherent. The strain between the film and substrate due to the 5% lattice constant mismatch is accommodated by formation of an array of misfit dislocations as well as 60° and 120° ferroelectric microdomains. The domains are located in a 20 nm thick region adjacent to the interface. Beyond the multidomain region, the film is free of significant defects.

UR - http://www.scopus.com/inward/record.url?scp=0000669250&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0000669250&partnerID=8YFLogxK

U2 - 10.1063/1.116734

DO - 10.1063/1.116734

M3 - Article

AN - SCOPUS:0000669250

SN - 0003-6951

VL - 68

SP - 761

EP - 763

JO - Applied Physics Letters

JF - Applied Physics Letters

IS - 6

ER -

Microstructure of epitaxial potassium niobate thin films prepared by metalorganic chemical vapor deposition

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