Midinfrared metamaterials fabricated by nanoimprint lithography

Wei Wu; Zhaoning Yu; Shih Yuan Wang; R. Stanley Williams; Yongmin Liu; Cheng Sun; Xiang Zhang; Evgenia Kim; Y. Ron Shen; Nicholas X. Fang

doi:10.1063/1.2450651

Midinfrared metamaterials fabricated by nanoimprint lithography

Wei Wu^*, Zhaoning Yu, Shih Yuan Wang, R. Stanley Williams, Yongmin Liu, Cheng Sun, Xiang Zhang, Evgenia Kim, Y. Ron Shen, Nicholas X. Fang

^*Corresponding author for this work

Mechanical Engineering

Research output: Contribution to journal › Article › peer-review

75 Scopus citations

Abstract

A metamaterial comprising an ordered array of four metallic L-shaped components designed to operate in the mid-IR frequency regime has been fabricated and characterized. The fourfold rotational symmetry of the unit cell should suppress the undesirable bianisotropy observed for split-ring resonators. Nanoimprint lithography was used to demonstrate scalability for mass production. A dipole plasmon resonance with a negative permittivity and a magnetic resonance with a negative permeability were observed at wavelengths of 3.7 and 5.25 μm, respectively, in agreement with theoretical predictions.

Original language	English (US)
Article number	063107
Journal	Applied Physics Letters
Volume	90
Issue number	6
DOIs	https://doi.org/10.1063/1.2450651
State	Published - 2007

ASJC Scopus subject areas

Physics and Astronomy (miscellaneous)

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10.1063/1.2450651

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abstract = "A metamaterial comprising an ordered array of four metallic L-shaped components designed to operate in the mid-IR frequency regime has been fabricated and characterized. The fourfold rotational symmetry of the unit cell should suppress the undesirable bianisotropy observed for split-ring resonators. Nanoimprint lithography was used to demonstrate scalability for mass production. A dipole plasmon resonance with a negative permittivity and a magnetic resonance with a negative permeability were observed at wavelengths of 3.7 and 5.25 μm, respectively, in agreement with theoretical predictions.",

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doi = "10.1063/1.2450651",

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volume = "90",

journal = "Applied Physics Letters",

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T1 - Midinfrared metamaterials fabricated by nanoimprint lithography

AU - Wu, Wei

AU - Yu, Zhaoning

AU - Wang, Shih Yuan

AU - Williams, R. Stanley

AU - Liu, Yongmin

AU - Sun, Cheng

AU - Zhang, Xiang

AU - Kim, Evgenia

AU - Shen, Y. Ron

AU - Fang, Nicholas X.

PY - 2007

Y1 - 2007

N2 - A metamaterial comprising an ordered array of four metallic L-shaped components designed to operate in the mid-IR frequency regime has been fabricated and characterized. The fourfold rotational symmetry of the unit cell should suppress the undesirable bianisotropy observed for split-ring resonators. Nanoimprint lithography was used to demonstrate scalability for mass production. A dipole plasmon resonance with a negative permittivity and a magnetic resonance with a negative permeability were observed at wavelengths of 3.7 and 5.25 μm, respectively, in agreement with theoretical predictions.

AB - A metamaterial comprising an ordered array of four metallic L-shaped components designed to operate in the mid-IR frequency regime has been fabricated and characterized. The fourfold rotational symmetry of the unit cell should suppress the undesirable bianisotropy observed for split-ring resonators. Nanoimprint lithography was used to demonstrate scalability for mass production. A dipole plasmon resonance with a negative permittivity and a magnetic resonance with a negative permeability were observed at wavelengths of 3.7 and 5.25 μm, respectively, in agreement with theoretical predictions.

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VL - 90

JO - Applied Physics Letters

JF - Applied Physics Letters

IS - 6

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ER -

Midinfrared metamaterials fabricated by nanoimprint lithography

Abstract

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