MOCVD challenge for III-V semiconductor materials for photonic and electronic devices on alternative substrates

M. Razeghi*, M. Defour, F. Omnes, P. Maurel, E. Bigan, O. Acher, J. Nagle, F. Brillouet, J. C. Portal

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

13 Scopus citations

Abstract

High quality III-V semiconductor heterojunctions, quantum wells and superlattices have been grown on lattice matched and alternative substrates such as silicon for photonic and electronic devices,using low pressure metalorganic chemical vapor deposition growth technique.

Original languageEnglish (US)
Pages (from-to)776-781
Number of pages6
JournalJournal of Crystal Growth
Volume93
Issue number1-4
DOIs
StatePublished - 1988

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Inorganic Chemistry
  • Materials Chemistry

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