MOCVD precursor delivery monitored and controlled using UV spectroscopy

Brian J. Rappoli*, William J. DeSisto, Tobin J. Marks, John A. Belot

*Corresponding author for this work

Research output: Contribution to journalConference articlepeer-review

Abstract

The glyme adducts of bis(1,1,1,5,5,5-hexafluoro-2,4-pentanedionate)barium, Ba(hfac)2·glyme, are frequently employed as precursors in the MOCVD fabrication of HTSC thin films. The physical properties of these precursors can be modified by changing the glyme ligand in the barium complex. In this study, gas phase concentrations of two barium complexes as a function of purge time and bubbler temperature have been examined by in-situ UV spectroscopy. Also presented are the details of a UV spectrophotometric-based feedback control system designed to maintain constant gas phase concentration of 2,2,6,6-tetramethyl-3,5-heptadionate (thd) precursors, Cu(thd)2 and Y(thd)3, during MOCVD growth of mixed metal oxide films.

Original languageEnglish (US)
Pages (from-to)69-75
Number of pages7
JournalMaterials Research Society Symposium - Proceedings
Volume477
DOIs
StatePublished - Jan 1 1997
EventProceedings of the 1997 MRS Spring Meeting - San Francisco, CA, USA
Duration: Mar 31 1997Apr 3 1997

ASJC Scopus subject areas

  • General Materials Science
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering

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