MOCVD routes to T1-2212/MgO/T1-2212 trilayers - Preliminary observations on growth and microstructural/electrical properties

B. J. Hinds, R. J. McNeely, J. Chen, C. Dias, D. L. Studebaker, T. J. Marks*, T. P. Hogan, J. L. Schindler, C. R. Kannewurf

*Corresponding author for this work

Research output: Contribution to journalArticle

2 Scopus citations

Abstract

The suitability of Tl2Ba2CaCu2O8 (Tl-2212) and MgO for growing SIS trilayers by metal-organic chemical vapor deposition (MOCVD) is examined. Low temperature (500°C) epitaxial (100) MgO film growth on (110) LaAlO3, by MOCVD using Mg(dpm)2 (dpm=2,2,6,6-tetramethyl-3,5-heptanedionate) is demonstrated, Tl-2212 does not decompose under these MgO growth conditions, although decomposition occurs at lower O2 partial pressures, To form trilayer structures, BaCaCuO(F) films are first grown on (1 10) LaAlO3 by MOCVD using Ba(hfa)2·mep (hfa=1,1,1,5,5,5-hexafluoropentane-2,4-dionate; mep=2,5,8,11,14,17-hexaoxanonadecane), Ca(hfa)2 tet (tet=2,5,8,11,14-pentaoxapentadecane) and Cu(dpm)2 precursors and are then post-annealed in the presence of bulk Tl2Ba2CaCu2O8 to form Tl-2212. MgO is then deposited by MOCVD. Finally, a top TBCCO layer is grown by MOCVD and subsequent Tl2O anneal to complete the trilayer. Both of the TBCCO layers are highly oriented, while the MgO layers are largely polycrystalline due to the rough underlying Tl-2212. Both TBCCO layers are superconducting (Tc∼105 K).

Original languageEnglish (US)
Pages (from-to)328-331
Number of pages4
JournalJournal of Alloys and Compounds
Volume251
Issue number1-2
DOIs
StatePublished - Apr 1997

Keywords

  • Devices
  • Dielectrics
  • MOCVD
  • Multilayer
  • Tl-2212

ASJC Scopus subject areas

  • Mechanics of Materials
  • Mechanical Engineering
  • Metals and Alloys
  • Materials Chemistry

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    Hinds, B. J., McNeely, R. J., Chen, J., Dias, C., Studebaker, D. L., Marks, T. J., Hogan, T. P., Schindler, J. L., & Kannewurf, C. R. (1997). MOCVD routes to T1-2212/MgO/T1-2212 trilayers - Preliminary observations on growth and microstructural/electrical properties. Journal of Alloys and Compounds, 251(1-2), 328-331. https://doi.org/10.1016/S0925-8388(96)02701-6