Abstract
Superconducting, semiconducting and insulating oxide thin films are of interest for applications as active and passive components in microelectronic device technologies. Metal organic chemical vapor deposition (MOCVD) is an important method of thin film production and its use in developing device structures such as that in the figure is discussed. (Figure Presented.)
| Original language | English (US) |
|---|---|
| Pages (from-to) | 719-730 |
| Number of pages | 12 |
| Journal | Advanced Materials |
| Volume | 6 |
| Issue number | 10 |
| DOIs | |
| State | Published - Oct 1994 |
ASJC Scopus subject areas
- General Materials Science
- Mechanics of Materials
- Mechanical Engineering