MOCVD Routes to Thin Metal Oxide Films for superconducting electronics

Douglas L. Schulz*, Tobin Jay Marks

*Corresponding author for this work

Research output: Contribution to journalReview articlepeer-review

73 Scopus citations

Abstract

Superconducting, semiconducting and insulating oxide thin films are of interest for applications as active and passive components in microelectronic device technologies. Metal organic chemical vapor deposition (MOCVD) is an important method of thin film production and its use in developing device structures such as that in the figure is discussed. (Figure Presented.)

Original languageEnglish (US)
Pages (from-to)719-730
Number of pages12
JournalAdvanced Materials
Volume6
Issue number10
DOIs
StatePublished - Jan 1 1994

ASJC Scopus subject areas

  • Materials Science(all)
  • Mechanics of Materials
  • Mechanical Engineering

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