Morphological characterization of selectively overgrown GaN via lateral epitaxy

Y. G. Wang*, Z. Zhang, Vinayak P Dravid, P. Kung, Manijeh Razeghi

*Corresponding author for this work

Research output: Contribution to journalArticle

Abstract

Morphology as well as the dislocation networks in epitaxial GaN thin film, prepared via selectively lateral overgrowth has been characterized using TEM combined with focused ion beam (FIB) tool. The results showed that orientations of the sidewalls dependent on the orientations of mask strips. The sidewalls coincide with the {112̄1} planes that form V type voids when the mask strips aligning along <11̄01> directions and correspond to the {11̄00} planes that result in rectangular voids if the strips arranging along the <112̄0> directions. The dislocations were observed along the plan view direction. The dislocations in the lateral overgrown region mainly developed along the direction perpendicular to the strips. The genetic aspect of such morphologies of GaN films may have very close relation with the change of growing fronts of the epitaxial layer.

Original languageEnglish (US)
Pages (from-to)1951-1957
Number of pages7
JournalJournal of Materials Science
Volume37
Issue number10
DOIs
StatePublished - May 15 2002

ASJC Scopus subject areas

  • Materials Science(all)
  • Mechanics of Materials
  • Mechanical Engineering

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