Morphological stability of alloy thin films

J. E. Guyer*, Peter W Voorhees

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

149 Scopus citations

Abstract

Misfit stresses are known to produce a morphological instability in dislocation-free thin films. We examine the linear stability of a planar, alloy thin film, growing by a deposition flux from the vapor. The stability of the film surface is influenced by stresses generated by both compositional inhomogeneity and lattice mismatch between the film and substrate. Under certain conditions, tensile misfit strain can completely stabilize the growing film, whereas the same magnitude of compressive strain is destabilizing. We compare our results with previous theoretical and experimental work.

Original languageEnglish (US)
Pages (from-to)4031-4034
Number of pages4
JournalPhysical Review Letters
Volume74
Issue number20
DOIs
StatePublished - Jan 1 1995

ASJC Scopus subject areas

  • Physics and Astronomy(all)

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