Abstract
The operation of the Bell Laboratories large capacity, multipurpose plasma reactor for materials research and processing is discussed. The design of the reactor is such that all the plasma parameters can be independently controlled. This device has been used for growing, deposition, etching, as well as charged-particle-beammilling of thin films.
| Original language | English (US) |
|---|---|
| Pages (from-to) | 278-280 |
| Number of pages | 3 |
| Journal | J VAC SCI TECHNOL |
| Volume | 14 |
| Issue number | 1 |
| State | Published - Jan 1 1976 |
ASJC Scopus subject areas
- Engineering(all)