Nano-indentation studies of ultrahigh strength carbon nitride thin films

Dong Li*, Yip Wah Chung, Ming Show Wong, William D. Sproul

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

207 Scopus citations

Abstract

Carbon nitride (CNx) thin films were prepared by dc magnetron sputtering of a graphite target in a nitrogen ambient onto Si(100) substrates held at ambient temperatures. The films are amorphous with a small volume fraction of nanocrystallites. All CNx coatings grown to a thickness of 1.5 μm are adherent and smooth. Nanoindentation studies showed clear dependence of hardness and effective modulus on deposition process parameters (nitrogen pressure, target power, and substrate bias). Most striking is the observation that CNx films can be synthesized with yield strength exceeding 5 GPa.

Original languageEnglish (US)
Pages (from-to)219-223
Number of pages5
JournalJournal of Applied Physics
Volume74
Issue number1
DOIs
StatePublished - 1993

ASJC Scopus subject areas

  • Physics and Astronomy(all)

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