Nano-Structuring by Molecular Self-Assembly

Caterina Minelli, Nicolas Blondiaux, Myriam Losson, Martha Liley, Sylvia Jeney, Christian Hinderling, Raphaël Pugin, Derk Joester, François Diederich, Julius Vancso, Mark Hempenius, Harry Heinzelmann*

*Corresponding author for this work

Research output: Contribution to journalArticle

4 Scopus citations

Abstract

In contrast to conventional lithography techniques which will soon hit their limits in terms of feature size and fabrication cost, recent years have seen considerable progress in the development of self-assembling nano-structured surfaces. In the work reported here, surface structures on the submicron scale have been created from polymer, copolymer, nanoparticle, and dendrimer building blocks by employing phenomena such as self-assembly, self-organization and non-equilibrium processes. This low-cost approach is expected to result in a new generation of surfaces with novel physical and chemical properties.

Original languageEnglish (US)
Pages (from-to)646-650
Number of pages5
JournalChimia
Volume57
Issue number10
DOIs
StatePublished - Jan 1 2003

Keywords

  • Dendrimer
  • Nanoparticle
  • Nanostructures
  • Polymer
  • Self-Assembly

ASJC Scopus subject areas

  • Chemistry(all)

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    Minelli, C., Blondiaux, N., Losson, M., Liley, M., Jeney, S., Hinderling, C., Pugin, R., Joester, D., Diederich, F., Vancso, J., Hempenius, M., & Heinzelmann, H. (2003). Nano-Structuring by Molecular Self-Assembly. Chimia, 57(10), 646-650. https://doi.org/10.2533/000942903777678786