Nanolithography with a NSOM tip - Part II: Experiments

Nicholas Fang*, Cheng Sun, Zhiliang Wan, Xiang Zhang

*Corresponding author for this work

Research output: Contribution to journalConference article

Abstract

We present in this paper a nanolithographic method by introducing a local photo-polymerization in the proximity of tapered optical fiber tip immersed in photocurable resin. The metallic apertured tip, when approached to a solid substrate at a few nanometers distance, delivers UV light to the vicinity of the tip apex and forms a subwavelength light source. The confined light source permits the polymerization to occur locally at the tip extremity, thus allowing generation of micronic/nanometric polymer features. The nanometric positioning control, realized by a commercial AFM operating in tapping mode, ensures the automation of nanolithographic process. The preliminary results presented here validate the concept of near field scanning optical lithography.

Original languageEnglish (US)
Pages (from-to)209-214
Number of pages6
JournalAmerican Society of Mechanical Engineers, Heat Transfer Division, (Publication) HTD
Volume369
Issue number6
StatePublished - Dec 1 2001
Event2001 ASME International Mechanical Engineering Congress and Exposition - New York, NY, United States
Duration: Nov 11 2001Nov 16 2001

ASJC Scopus subject areas

  • Mechanical Engineering
  • Fluid Flow and Transfer Processes

Fingerprint Dive into the research topics of 'Nanolithography with a NSOM tip - Part II: Experiments'. Together they form a unique fingerprint.

  • Cite this