Nanopatterning with conformable phase masks

Joana Maria; Seokwoo Jeon; John A. Rogers

doi:10.1016/j.jphotochem.2004.04.035

Nanopatterning with conformable phase masks

Joana Maria, Seokwoo Jeon, John A. Rogers^*

^*Corresponding author for this work

Materials Science and Engineering

Research output: Contribution to journal › Article › peer-review

35 Scopus citations

Abstract

This paper describes an approach for using conventional photoresist materials to pattern structures with dimensions as small as 50 nm. This method, known as near field phase shift lithography (NFPSL), is an experimentally simple approach to nanofabrication that relies on ultraviolet exposure of a layer of resist while it is in conformal, atomic scale contact with such an elastomeric phase mask. This paper presents some representative structures produced with this method; it illustrates an example of its use in patterning the critical dimensions of organic transistors; and it outlines some new modeling results of the optics associated with this technique.

Original language	English (US)
Pages (from-to)	149-154
Number of pages	6
Journal	Journal of Photochemistry and Photobiology A: Chemistry
Volume	166
Issue number	1-3
DOIs	https://doi.org/10.1016/j.jphotochem.2004.04.035
State	Published - Aug 12 2004

Keywords

Elastomer
Nanofabrication
Near field optics
Phase mask
Photolithography
Soft lithography

ASJC Scopus subject areas

Chemistry(all)
Chemical Engineering(all)
Physics and Astronomy(all)

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10.1016/j.jphotochem.2004.04.035

Cite this

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title = "Nanopatterning with conformable phase masks",

abstract = "This paper describes an approach for using conventional photoresist materials to pattern structures with dimensions as small as 50 nm. This method, known as near field phase shift lithography (NFPSL), is an experimentally simple approach to nanofabrication that relies on ultraviolet exposure of a layer of resist while it is in conformal, atomic scale contact with such an elastomeric phase mask. This paper presents some representative structures produced with this method; it illustrates an example of its use in patterning the critical dimensions of organic transistors; and it outlines some new modeling results of the optics associated with this technique.",

keywords = "Elastomer, Nanofabrication, Near field optics, Phase mask, Photolithography, Soft lithography",

author = "Joana Maria and Seokwoo Jeon and Rogers, {John A.}",

note = "Funding Information: We thank our collaborators at Harvard University for our initial work with this technique and our collaborators at Bell Labs for the device level applications of it. The recent modeling efforts were performed using funding from the Department of Energy. J.M. acknowledges a fellowship from the government of Portugal.",

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AU - Maria, Joana

AU - Jeon, Seokwoo

AU - Rogers, John A.

N1 - Funding Information: We thank our collaborators at Harvard University for our initial work with this technique and our collaborators at Bell Labs for the device level applications of it. The recent modeling efforts were performed using funding from the Department of Energy. J.M. acknowledges a fellowship from the government of Portugal.

PY - 2004/8/12

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N2 - This paper describes an approach for using conventional photoresist materials to pattern structures with dimensions as small as 50 nm. This method, known as near field phase shift lithography (NFPSL), is an experimentally simple approach to nanofabrication that relies on ultraviolet exposure of a layer of resist while it is in conformal, atomic scale contact with such an elastomeric phase mask. This paper presents some representative structures produced with this method; it illustrates an example of its use in patterning the critical dimensions of organic transistors; and it outlines some new modeling results of the optics associated with this technique.

AB - This paper describes an approach for using conventional photoresist materials to pattern structures with dimensions as small as 50 nm. This method, known as near field phase shift lithography (NFPSL), is an experimentally simple approach to nanofabrication that relies on ultraviolet exposure of a layer of resist while it is in conformal, atomic scale contact with such an elastomeric phase mask. This paper presents some representative structures produced with this method; it illustrates an example of its use in patterning the critical dimensions of organic transistors; and it outlines some new modeling results of the optics associated with this technique.

KW - Elastomer

KW - Nanofabrication

KW - Near field optics

KW - Phase mask

KW - Photolithography

KW - Soft lithography

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JF - Journal of Photochemistry and Photobiology A: Chemistry

IS - 1-3

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Nanopatterning with conformable phase masks

Abstract

Keywords

ASJC Scopus subject areas

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