Nanopatterning with conformable phase masks

Joana Maria, Seokwoo Jeon, John A. Rogers*

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

34 Scopus citations

Abstract

This paper describes an approach for using conventional photoresist materials to pattern structures with dimensions as small as 50 nm. This method, known as near field phase shift lithography (NFPSL), is an experimentally simple approach to nanofabrication that relies on ultraviolet exposure of a layer of resist while it is in conformal, atomic scale contact with such an elastomeric phase mask. This paper presents some representative structures produced with this method; it illustrates an example of its use in patterning the critical dimensions of organic transistors; and it outlines some new modeling results of the optics associated with this technique.

Original languageEnglish (US)
Pages (from-to)149-154
Number of pages6
JournalJournal of Photochemistry and Photobiology A: Chemistry
Volume166
Issue number1-3
DOIs
StatePublished - Aug 12 2004

Keywords

  • Elastomer
  • Nanofabrication
  • Near field optics
  • Phase mask
  • Photolithography
  • Soft lithography

ASJC Scopus subject areas

  • Chemistry(all)
  • Chemical Engineering(all)
  • Physics and Astronomy(all)

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