Nanoscale molecular-switch devices fabricated by imprint lithography

Yong Chen; Douglas A A Ohlberg; Xuema Li; Duncan R. Stewart; R. Stanley Williams; Jan O. Jeppesen; Kent A. Nielsen; J. Fraser Stoddart; Deirdre L. Olynick; Erik Andersen

doi:10.1063/1.1559439

Nanoscale molecular-switch devices fabricated by imprint lithography

Yong Chen^*, Douglas A A Ohlberg, Xuema Li, Duncan R. Stewart, R. Stanley Williams, Jan O. Jeppesen, Kent A. Nielsen, J. Fraser Stoddart, Deirdre L. Olynick, Erik Andersen

^*Corresponding author for this work

Chemistry

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267 Scopus citations

Abstract

The fabrication of nanoscale molecular-switch devices by imprint lithography was presented. The imprinting mold was fabricated into thermally grown silicon oxide on a silicon substrate using electron-beam lithography and reactive-ion etching. Bistable current-voltage characteristics with high on-off ratios and reversible switching properties were observed.

Original language	English (US)
Pages (from-to)	1610-1612
Number of pages	3
Journal	Applied Physics Letters
Volume	82
Issue number	10
DOIs	https://doi.org/10.1063/1.1559439
State	Published - Mar 10 2003

ASJC Scopus subject areas

Physics and Astronomy (miscellaneous)

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10.1063/1.1559439

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title = "Nanoscale molecular-switch devices fabricated by imprint lithography",

abstract = "The fabrication of nanoscale molecular-switch devices by imprint lithography was presented. The imprinting mold was fabricated into thermally grown silicon oxide on a silicon substrate using electron-beam lithography and reactive-ion etching. Bistable current-voltage characteristics with high on-off ratios and reversible switching properties were observed.",

author = "Yong Chen and Ohlberg, {Douglas A A} and Xuema Li and Stewart, {Duncan R.} and Williams, {R. Stanley} and Jeppesen, {Jan O.} and Nielsen, {Kent A.} and Stoddart, {J. Fraser} and Olynick, {Deirdre L.} and Erik Andersen",

year = "2003",

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T1 - Nanoscale molecular-switch devices fabricated by imprint lithography

AU - Chen, Yong

AU - Ohlberg, Douglas A A

AU - Li, Xuema

AU - Stewart, Duncan R.

AU - Williams, R. Stanley

AU - Jeppesen, Jan O.

AU - Nielsen, Kent A.

AU - Stoddart, J. Fraser

AU - Olynick, Deirdre L.

AU - Andersen, Erik

PY - 2003/3/10

Y1 - 2003/3/10

N2 - The fabrication of nanoscale molecular-switch devices by imprint lithography was presented. The imprinting mold was fabricated into thermally grown silicon oxide on a silicon substrate using electron-beam lithography and reactive-ion etching. Bistable current-voltage characteristics with high on-off ratios and reversible switching properties were observed.

AB - The fabrication of nanoscale molecular-switch devices by imprint lithography was presented. The imprinting mold was fabricated into thermally grown silicon oxide on a silicon substrate using electron-beam lithography and reactive-ion etching. Bistable current-voltage characteristics with high on-off ratios and reversible switching properties were observed.

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DO - 10.1063/1.1559439

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JO - Applied Physics Letters

JF - Applied Physics Letters

IS - 10

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Nanoscale molecular-switch devices fabricated by imprint lithography

Abstract

ASJC Scopus subject areas

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