Nanoscale molecular-switch devices fabricated by imprint lithography

Yong Chen*, Douglas A A Ohlberg, Xuema Li, Duncan R. Stewart, R. Stanley Williams, Jan O. Jeppesen, Kent A. Nielsen, J. Fraser Stoddart, Deirdre L. Olynick, Erik Andersen

*Corresponding author for this work

Research output: Contribution to journalArticle

253 Scopus citations

Abstract

The fabrication of nanoscale molecular-switch devices by imprint lithography was presented. The imprinting mold was fabricated into thermally grown silicon oxide on a silicon substrate using electron-beam lithography and reactive-ion etching. Bistable current-voltage characteristics with high on-off ratios and reversible switching properties were observed.

Original languageEnglish (US)
Pages (from-to)1610-1612
Number of pages3
JournalApplied Physics Letters
Volume82
Issue number10
DOIs
StatePublished - Mar 10 2003

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

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    Chen, Y., Ohlberg, D. A. A., Li, X., Stewart, D. R., Williams, R. S., Jeppesen, J. O., Nielsen, K. A., Stoddart, J. F., Olynick, D. L., & Andersen, E. (2003). Nanoscale molecular-switch devices fabricated by imprint lithography. Applied Physics Letters, 82(10), 1610-1612. https://doi.org/10.1063/1.1559439