Nanoscale molecular-switch devices fabricated by imprint lithography

Yong Chen*, Douglas A A Ohlberg, Xuema Li, Duncan R. Stewart, R. Stanley Williams, Jan O. Jeppesen, Kent A. Nielsen, J. Fraser Stoddart, Deirdre L. Olynick, Erik Andersen

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

256 Scopus citations


The fabrication of nanoscale molecular-switch devices by imprint lithography was presented. The imprinting mold was fabricated into thermally grown silicon oxide on a silicon substrate using electron-beam lithography and reactive-ion etching. Bistable current-voltage characteristics with high on-off ratios and reversible switching properties were observed.

Original languageEnglish (US)
Pages (from-to)1610-1612
Number of pages3
JournalApplied Physics Letters
Issue number10
StatePublished - Mar 10 2003

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)


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