NANOSCALE, SPATIALLY-CONTROLLED GA DOPING OF UNDOPED TRANSPARENT CONDUCTING OXIDE FILMS

Keyphrases

• Advanced Materials 33%
• Background Material 33%
• Charging Problem 33%
• Circuitry 33%
• Conducting Oxide 100%
• Conductive Substrate 33%
• Controlled Doping 33%
• Dimension Properties 33%
• Diverse Features 33%
• Electrical Interconnect 33%
• Electrical Properties 66%
• Electrically Conducting 33%
• Electrically Insulating 33%
• Electrochromic Windows 33%
• Enhanced Electrical Conductivity 33%
• Flat Panel Display 33%
• Focused Ion Beam 100%
• Ga Doping 100%
• Indium Oxide 33%
• Indium Oxide Thin Films 33%
• Insulating Substrate 33%
• Invisible 33%
• Ion Beam 33%
• Ion Beam Doping 33%
• Ion Etching 33%
• Ion Implantation 33%
• Manufacturing Methods 33%
• Metal Deposition 33%
• Metal Ions 33%
• Nanometer Scale 33%
• Nanoscale Doping 33%
• Optical Transparency 66%
• Optically Transparent Electrode 33%
• Oxide Nanotubes 33%
• Oxide Surfaces 33%
• Photovoltaic Cells 33%
• Semiconducting Substrate 33%
• Spatial Control 33%
• Spatial Dimension 33%
• Spatial Properties 33%
• Transparent Conducting 33%
• Transparent Conducting Oxide 100%
• Undoped 100%
• Varying Length 33%
• Visible Spectrum 33%
• Wide Bandgap 33%

Material Science

• Advanced Material 20%
• Electrical Conductivity 20%
• Electrochromics 20%
• Focused Ion Beam 60%
• Indium 40%
• Ion Implantation 20%
• Metal Deposition 20%
• Nanowires 20%
• Oxide Compound 100%
• Oxide Film 100%
• Oxide Surface 20%
• Solar Cell 20%
• Transparent Conducting Oxide 100%