Nanoscale writing of transparent conducting oxide features with a focused ion beam

INIS

• ion beams 100%
• oxides 100%
• thin films 66%
• nanostructures 66%
• probes 66%
• deposition 66%
• doped materials 66%
• metals 33%
• films 33%
• fabrication 33%
• substrates 33%
• mapping 33%
• ions 33%
• temperature range 0273-0400 k 33%
• oxygen 33%
• diamonds 33%
• wires 33%
• nanowires 33%
• glass 33%
• atomic force microscopy 33%
• partial pressure 33%
• guns 33%
• boron 33%

Material Science

• Focused Ion Beam 100%
• Thin Films 66%
• Probe 66%
• Boron 33%
• Oxide 33%
• Metal Oxide 33%
• Nanowires 33%
• Transparent Conducting Oxide 33%
• Ion Beam Assisted Deposition 33%
• Liquid Films 33%
• Glass 33%
• Temperature 33%
• Diamond 33%