Nanosphere lithography: A materials general fabrication process for periodic particle array surfaces

John C. Hulteen, Richard P. Van Duvne

Research output: Contribution to journalArticle

1276 Scopus citations

Abstract

In this article nanosphere lithography (NSL) is demonstrated to be a materials general fabrication process for the production of periodic particle array (PPA) surfaces having nanometer scale features. A variety of PPA surfaces have been prepared using identical single-layer (SL) and double-layer (DL) NSL masks made by self-assembly of polymer nanospheres with diameter, D=264 nm, and varying both the substrate material S and the particle material M. In the examples shown here, S was an insulator, semiconductor, or metal and M was a metal, inorganic ionic insulator, or an organic 7r-electron semiconductor. PPA structural characterization and determination of nanoparticle metrics was accomplished with atomic force microscopy. This is the first demonstration of nanometer scale PPA surfaces formed from molecular materials.

Original languageEnglish (US)
Pages (from-to)1553-1558
Number of pages6
JournalJournal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Volume13
Issue number3
DOIs
StatePublished - May 1995

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films

Fingerprint Dive into the research topics of 'Nanosphere lithography: A materials general fabrication process for periodic particle array surfaces'. Together they form a unique fingerprint.

  • Cite this