Abstract
End Cutting 1D layout design is a promising candidate for sub-10nm process nodes. Given a 1D layout with horizontal wires, cut redistribution technique is used for sliding the line-end cuts in order to align them vertically or resolve spacing conflicts. The aligned cuts can then be merged into a single shot of cuts. In this paper, we proposed a network flow based method for efficient cut redistribution and insertion. Normally, a pair of movable cuts could have three possible relations, left-of, right-of and merge-into. We observe that if the left-right-merge orderings of cuts are fixed, the cut redistribution can be formulated as a network flow problem, which can be solved efficiently. We also find that inserting cuts can resolve the spacing conflicts in some circumstances. This cut insertion strategy is introduced in our proposed method to reduce the spacing conflicts. Moreover, the complementary e-beam lithography for printing the cuts is also considered in this paper. Experimental results show that compared with a previous ILP-based method, our method can achieve a 200X speedup and competitive solution quality.
| Original language | English (US) |
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| Title of host publication | 2017 22nd Asia and South Pacific Design Automation Conference, ASP-DAC 2017 |
| Publisher | Institute of Electrical and Electronics Engineers Inc. |
| Pages | 360-365 |
| Number of pages | 6 |
| ISBN (Electronic) | 9781509015580 |
| DOIs | |
| State | Published - Feb 16 2017 |
| Event | 22nd Asia and South Pacific Design Automation Conference, ASP-DAC 2017 - Chiba, Japan Duration: Jan 16 2017 → Jan 19 2017 |
Publication series
| Name | Proceedings of the Asia and South Pacific Design Automation Conference, ASP-DAC |
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Other
| Other | 22nd Asia and South Pacific Design Automation Conference, ASP-DAC 2017 |
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| Country/Territory | Japan |
| City | Chiba |
| Period | 1/16/17 → 1/19/17 |
Funding
This research was supported partly by Science Challenge Project, No. JCKY2016212A503, partly by National Science Foundation of China (NSFC) research projects 61376040, 61474026, 61574046, 61274032, 61674042, 61574044 and 91330201, partly by NSF Grant 1441695 and 1533656, partly by Chen Guang project supported by Shanghai Municipal Education Commission and Shanghai Education Development Foundation, partly by the fund of CAEP-SCNS(R2016-03-010), and partly by the Recruitment Program of Global Experts (the Thousand Talents Plan).
ASJC Scopus subject areas
- Electrical and Electronic Engineering
- Computer Science Applications
- Computer Graphics and Computer-Aided Design