Next Generation Dopant Gas Delivery System for Ion Implant Applications

J Arno, Omar k Farha, W Morris, P Siu, G Tom, M Weston, P Fuller, J McCabe, M Ameen

Research output: Contribution to journal › Article

Cite this

@article{0d3932da465945328f498eaaa4ad593a,

title = "Next Generation Dopant Gas Delivery System for Ion Implant Applications",

author = "J Arno and Farha, {Omar k} and W Morris and P Siu and G Tom and M Weston and P Fuller and J McCabe and M Ameen",

year = "2018",

language = "English (US)",

volume = "April/May",

pages = "27--30",

journal = "Solid State Technology",

issn = "0038-111X",

publisher = "Pennwell Corporation",

}