Keyphrases
Computational Modeling
100%
Scanning Tunneling Microscopy
100%
Free Radicals
100%
Si(111)
100%
Nitroxyl
100%
Density of States
50%
Isosurface
50%
Bias Dependence
50%
Nanopatterning
25%
Cluster Model
25%
Room Temperature
25%
Density Functional Calculations
25%
Ultra-high Vacuum
25%
Lithography
25%
Atomic Precision
25%
Monohydrides
25%
Scanning Tunneling Microscope
25%
Isolated Molecules
25%
Occupied State
25%
Valence Electrons
25%
Unoccupied States
25%
Electron Stimulated Desorption
25%
Temperature Study
25%
Lowest Unoccupied Molecular Orbital
25%
Silicon Clusters
25%
Dangling Bonds
25%
Si Dangling Bonds
25%
Singly Occupied Molecular Orbital
25%
Binding Chemistry
25%
Chemistry
Nitroxyl
100%
Scanning Tunneling Microscopy
100%
Radical (Chemistry)
100%
Dangling Bond
100%
Desorption
50%
Isolated Molecule
50%
Cluster Model
50%
Lowest Unoccupied Molecular Orbital
50%
Lithography
50%
Ambient Reaction Temperature
50%
Chemistry
50%
Silicon
50%
Molecular Orbital
50%
dimer
50%
Engineering
Modeling Study
100%
Isosurface
100%
Scanning Tunneling Microscopy
100%
Dangling Bond
100%
Scanning Tunneling Microscope
50%
Nanopatterning
50%
Lithography
50%
Silicon Cluster
50%
Room Temperature
50%
Molecular Orbital
50%
Lowest Unoccupied Molecular Orbital
50%
Medicine and Dentistry
Scanning Tunneling Microscopy
100%
Radical (Chemistry)
100%
Isosurface
100%
Dimer
50%
Density Functional Theory
50%
Scanning Tunneling Microscopy
50%
Material Science
Density
100%
Scanning Tunneling Microscopy
100%
Surface (Surface Science)
66%
Desorption
33%
Lithography
33%
Silicon
33%