NONDESTRUCTIVE CHARACTERIZATION OF INTERFACE LAYERS BETWEEN Si OR GaAs AND THEIR OXIDES BY SPECTROSCOPIC ELLIPSOMETRY.

D. E. Aspnes*, J. B. Theeten, R. P H Chang

*Corresponding author for this work

Research output: Contribution to journalConference articlepeer-review

27 Scopus citations

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Biochemistry, Genetics and Molecular Biology